Promoters, poisons and surfactants: Electronic effects of surface doping on metals

被引:42
作者
Bertel, E
Memmel, N
机构
[1] Max-Planck-Inst. fur Plasmaphysik, Abteilung Oberflächenphysik, EURATOM-Association, D-85740 Garching
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1996年 / 63卷 / 06期
关键词
D O I
10.1007/BF01567208
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The interaction of adsorbates with metal surfaces is discussed. It is shown that the evanescent charge density produced by occupied sp derived surface states yields a considerable contribution to the Pauli repulsion experienced by adsorbate particles with a closed-shell electronic structure, e.g. rare-gases or molecules such as H-2 or N-2 For rare-gases this results in a reduction of the binding energy in the presence of occupied surface states, for molecules this gives rise to an additional contribution to the dissociation barrier. Suitable surface dopants are able to depopulate surface states and thereby to reduce the dissociation barrier. Such dopants can substantially promote catalytic reactions in which the dissociation from the gas phase or a physisorbed precursor is the rate limiting step. In contrast to closed-shell systems the bonding interaction for metal adsorbates on metal substrates is enhanced by occupied surface states. This leads to an extra diffusion barrier at steps, because the surface state amplitude drops to zero at upper step edges. The additional step-edge barrier, which is a kinetic hindrance for layer-by-layer growth, can be reduced by surface dopants depopulating the corresponding surface state. Such dopants promote layer-by-layer growth and act therefore as surfactants. It is concluded that the effect of promoters in catalysis and of surfactants in metal epitaxy is in part due to the same basic mechanism, namely the depopulation of surface states.
引用
收藏
页码:523 / 531
页数:9
相关论文
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