Ultrafast laser photoinscription of polarization sensitive devices in bulk silica glass

被引：69

作者：

Cheng, G. ^{[1
]}

Mishchik, K. ^{[1
]}

Mauclair, C. ^{[1
]}

Audouard, E. ^{[1
]}

Stoian, R. ^{[1
]}

机构：

[1] Univ Lyon, Univ St Etienne, CNRS, Lab Hubert Curien,UMR 5516, F-42023 St Etienne, France

来源：

OPTICS EXPRESS | 2009年 / 17卷 / 12期

关键词：

FUSED-SILICA; WAVE-GUIDES; 3RD-HARMONIC GENERATION; INDUCED BIREFRINGENCE; FORM BIREFRINGENCE; LIGHT-SCATTERING; INDEX CHANGE; WRITTEN; FILAMENTATION; IRRADIATION;

D O I：

10.1364/OE.17.009515

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Ultrashort pulsed laser irradiation of bulk fused silica may result under specific energetic conditions in the self-organization of subwave-length material redistribution regions within the laser trace. The modulated structures have birefringent properties and show unusual anisotropic light scattering and reflection characteristics. We report here on the formation of waveguiding structures with remarkable polarization effects for infrared light. The photoinscription process using 800 nm femtosecond laser pulses is accompanied by third harmonic generation and polarization dependent anisotropic scattering of UV photons. The photowritten structures can be arranged in three-dimensional patterns generating complex propagation and polarization effects due to the anisotropic optical properties. (C) 2009 Optical Society of America

引用

页码：9515 / 9525

页数：11

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