Nanometer-scale metrology: Meeting the nanotechnology measurement challenges

被引:0
作者
Postek, MT [1 ]
机构
[1] Natl Inst Stand & Technol, Gaithersburg, MD 20899 USA
来源
NANOSTRUCTURE SCIENCE, METROLOGY AND TECHNOLOGY | 2002年
关键词
metrology; molecular measuring machine; standards; modeling; nanometer; scanning electron microscopy; scanned probe microscopy; proximal probe; lithography; critical dimension; interferometry; linescale;
D O I
暂无
中图分类号
V [航空、航天];
学科分类号
08 ; 0825 ;
摘要
NIST is responsible to U.S. industry for developing length intensive measurement capabilities and calibration standards in the nanometer scale regime. The Nanometer-Scale Metrology Program is an integrated Manufacturing Engineering Laboratory program composed of projects all aimed at accurate nano-length metrology. These projects range (in part) from scanning probe microscopies, optical microscopy, interferometry, scanning electron microscopy, and include traditional linescale interferometry which maintains the NIST capability for length scale measurements at a World-class level. The industrial relevancy of the research and standards provided by this program has resulted in a large number of industrial interactions.
引用
收藏
页码:102 / 106
页数:5
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