Colliding laser-produced plasmas as targets for laser-generated extreme ultraviolet sources

被引:28
作者
Cummins, T. [1 ]
O'Gorman, C. [1 ]
Dunne, P. [1 ]
Sokell, E. [1 ]
O'Sullivan, G. [1 ]
Hayden, P. [1 ,2 ,3 ]
机构
[1] Natl Univ Ireland Univ Coll Dublin, Sch Phys, Dublin 4, Ireland
[2] Dublin City Univ, Sch Phys Sci, Dublin 9, Ireland
[3] Dublin City Univ, Natl Ctr Plasma Sci & Technol, Dublin 9, Ireland
基金
爱尔兰科学基金会;
关键词
LITHOGRAPHY;
D O I
10.1063/1.4891762
中图分类号
O59 [应用物理学];
学科分类号
摘要
Colliding plasmas produced by neodymium-doped yttrium aluminium garnet (Nd:YAG) laser illumination of tin wedge targets form stagnation layers, the physical parameters of which can be controlled to optimise coupling with a carbon dioxide (CO2) heating laser pulse and subsequent extreme ultraviolet (EUV) production. The conversion efficiency (CE) of total laser energy into EUV emission at 13.5 nm +/- 1% was 3.6%. Neglecting both the energy required to form the stagnation layer and the EUV light produced before the CO2 laser pulse is incident results in a CE of 5.1% of the CO2 laser energy into EUV light. (C) 2014 AIP Publishing LLC.
引用
收藏
页数:4
相关论文
共 31 条
[1]  
Attwood D.T., 2000, SOFT XRAYS EXTREME U
[2]   Analyses of the SnIX-Sn XII spectra in the EUV region [J].
Churilov, SS ;
Ryabtsev, AN .
PHYSICA SCRIPTA, 2006, 73 (06) :614-619
[3]   Stagnation layers at the collision front between two laser-induced plasmas: A study using time-resolved imaging and spectroscopy [J].
Dardis, J. ;
Costello, J. T. .
SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY, 2010, 65 (08) :627-635
[4]   Development of stable extreme-ultraviolet sources for use in lithography exposure systems [J].
Fomenkov, Igor V. ;
La Fontaine, Bruno ;
Brown, Daniel ;
Ahmad, Imtiaz ;
Baumgart, Peter ;
Boewering, Norbert R. ;
Brandt, David C. ;
Bykanov, Alexander N. ;
De Dea, Silvia ;
Ershov, Alex I. ;
Farrar, Nigel R. ;
Golich, Dan J. ;
Lercel, Mike J. ;
Myers, David W. ;
Rajyaguru, Chiraq ;
Srivastava, Shailendra N. ;
Tao, Yezheng ;
Vaschenko, Georgiy O. .
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02)
[5]   Laser-produced plasma-based extreme-ultraviolet light source technology for high-volume manufacturing extreme-ultraviolet lithography [J].
Fujimoto, Junichi ;
Abe, Tamotsu ;
Tanaka, Satoshi ;
Ohta, Takeshi ;
Hori, Tsukasa ;
Yanagida, Tatsuya ;
Nakarai, Hiroaki ;
Mizoguchi, Hakaru .
JOURNAL OF MICRO-NANOLITHOGRAPHY MEMS AND MOEMS, 2012, 11 (02)
[6]   Development of laser-produced plasma based EUV light source technology for HVM EUV lithography [J].
Fujimoto, Junichi ;
Hori, Tsukasa ;
Yanagida, Tatsuya ;
Ohta, Takeshi ;
Kawasuji, Yasufumi ;
Shiraishi, Yutaka ;
Abe, Tamotsu ;
Kodama, Takeshi ;
Nakarai, Hiroaki ;
Yamazaki, Taku ;
Mizoguchi, Hakaru .
EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY III, 2012, 8322
[7]   Opacity effect on extreme ultraviolet radiation from laser-produced tin plasmas [J].
Fujioka, S ;
Nishimura, H ;
Nishihara, K ;
Sasaki, A ;
Sunahara, A ;
Okuno, T ;
Ueda, N ;
Ando, T ;
Tao, YZ ;
Shimada, Y ;
Hashimoto, K ;
Yamaura, M ;
Shigemori, K ;
Nakai, M ;
Nagai, K ;
Norimatsu, T ;
Nishikawa, T ;
Miyanaga, N ;
Izawa, Y ;
Mima, K .
PHYSICAL REVIEW LETTERS, 2005, 95 (23)
[8]   Pure-tin microdroplets irradiated with double laser pulses for efficient and minimum-mass extreme-ultraviolet light source production [J].
Fujioka, Shinsuke ;
Shimomura, Masashi ;
Shimada, Yoshinori ;
Maeda, Shinsuke ;
Sakaguchi, Hirokazu ;
Nakai, Yuki ;
Aota, Tatsuya ;
Nishimura, Hiroaki ;
Ozaki, Norimasa ;
Sunahara, Atsushi ;
Nishihara, Katsunobu ;
Miyanaga, Noriaki ;
Izawa, Yasukazu ;
Mima, Kunioki .
APPLIED PHYSICS LETTERS, 2008, 92 (24)
[9]   Dynamics of colliding aluminium plasmas produced by laser ablation [J].
Gambino, N. ;
Hayden, P. ;
Mascali, D. ;
Costello, J. ;
Fallon, C. ;
Hough, P. ;
Yeates, P. ;
Anzalone, A. ;
Musumeci, F. ;
Tudisco, S. .
APPLIED SURFACE SCIENCE, 2013, 272 :69-75
[10]   Efficient laser-produced plasma extreme ultraviolet sources using grooved Sn targets [J].
Harilal, S. S. ;
Sizyuk, T. ;
Sizyuk, V. ;
Hassanein, A. .
APPLIED PHYSICS LETTERS, 2010, 96 (11)