Atom probe field-ion microscopy characterization of nickel and titanium aluminides

被引：20
作者：
Larson, DJ [1 ]
Miller, MK [1 ]
机构：
[1] Oak Ridge Natl Lab, Div Met & Ceram, Microscopy & Microanalyt Sci Grp, Oak Ridge, TN 37831 USA
来源：
MATERIALS CHARACTERIZATION | 2000年 / 44卷 / 1-2期
关键词：
D O I：
10.1016/S1044-5803(99)00049-2
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A review of the contributions of atom probe field-ion microscopy to the characterization of nickel and titanium aluminides is presented. The nickel aluminide systems studied include boron-doped Ni3Al and boron-, carbon-, beryllium-, zirconium-, molybdenum-, and hafnium-doped NiAl. These systems have been characterized in terms of solute segregation to boundaries, dislocations, and other defects, matrix solubilities, precipitation, and site-occupation probabilities. The partitioning behavior of impurities and alloying additions, matrix solubilities, precipitate compositions, and interfacial segregation in several of alpha(2) + gamma titanium aluminides and related alloys are also reviewed. Published by Elsevier Science Inc.
引用
收藏
页码：159 / 176
页数：18
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