Magnetron deposition of coatings with evaporation of the target

被引：22

作者：

Bleykher, G. A. ^{[1
]}

Krivobokov, V. P. ^{[1
]}

Yuryeva, A. V. ^{[1
]}

机构：

[1] Natl Res Tomsk Polytech Univ, Tomsk 634050, Russia

来源：

TECHNICAL PHYSICS | 2015年 / 60卷 / 12期

基金：

俄罗斯基础研究基金会;

关键词：

Power Density; Current Pulse; Evaporation Rate; Target Surface; Intense Evaporation;

D O I：

10.1134/S1063784215120026

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We analyze the potentialities of the plasma in various types of magnetron sputtering systems including pulsed and liquid-target systems for producing intense emission of atoms and high-rate deposition of coatings. For this purpose, a mathematical model of thermal and erosion processes in the target is developed based on the heat conduction equations taking into account first-order phase transitions. Using this model, we determine the parameters of magnetrons for which intense evaporation of atoms from the target surface takes place. It is shown that evaporation leads to an increase in the growth rate of metal coatings by 1-2 orders of magnitude as compared to conventional magnetron systems based only on collisional sputtering.

引用

页码：1790 / 1795

页数：6

共 12 条

[1] The regularities of solid surface erosion and coating deposition using high-power pulsed beams of charged particles [J].