Review of x-ray collimators for x-ray proximity lithography

被引：1

作者：

Lane, S ^{[1
]}

Barbee, T ^{[1
]}

Mrowka, S ^{[1
]}

Maldonado, J ^{[1
]}

机构：

[1] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

来源：

EUV, X-RAY, AND NEUTRON OPTICS AND SOURCES | 1999年 / 3767卷

关键词：

x-ray collimators; x-ray proximity lithography; x-ray optics;

D O I：

10.1117/12.371115

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Simple arguments are given that elucidate the need for x-ray collimator optics in point source proximity lithography. Seven recent collimator optics designs are briefly described. Three of these designs are described in greater detail: a flat mirror array developed by Xmetrics, Inc.; a polycapillary array developed by X-Ray Optical Systems, Inc.; and a scanning paraboloidal collimator developed by Lawrence Livermore National Laboratory. For the latter two collimators test results using the JMAR Technologies, Inc. laser plasma x-ray point source are given.

引用

页码：172 / 182

页数：11

共 11 条

[1]

*BELL LAB, 1997, DARPA ADV LITH PROGR

[2]

CASH W, 1999, IN PRESS SPIE, V3767

[3]

CHEN Z, 1999, IN PRESS SPIE, V3767

[4]

FELLER B, 1997, DARPA ADV LITHOGRAPH

[5]

Franco E., COMMUNICATION

[6]

Guo L., COMMUNICATION

[7]

OHARA D, 1997, DARPA ADV LITHOGRAPH

[8]

PRASAD RR, 1994, P SOC PHOTO-OPT INS, V2194, P120, DOI 10.1117/12.175797

[9]

SHEATS JR, 1998, MICROLITHOGRAPHY

[10] Aspheric collimator for a point source x-ray lithography system [J].

Singh-Gasson, S ;

Vladimirsky, Y ;

Cerrina, F .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1998, 16 (06) :3456-3461

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