Method for compensation of extreme-ultraviolet multilayer defects

被引：29

作者：

Ray-Chaudhuri, AK ^{[1
]}

Cardinale, G

Fisher, A

Yan, PY

Sweeney, DW

机构：

[1] Sandia Natl Labs, Livermore, CA 94550 USA

[2] Intel Corp, Santa Clara, CA USA

[3] Univ Calif Lawrence Livermore Natl Lab, Livermore, CA 94550 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.590947

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We propose the use of optical proximity correction on absorber features to compensate for the effect of subresolution multilayer defects that would otherwise induce a critical error in linewidth. Initial experiments have been performed which validate this concept. Process window simulations quantify the practical limits of this technique. (C) 1999 American Vacuum Society. [S0734-211X(99)19806-8].

引用

页码：3024 / 3028

页数：5

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