Guiding and confining light in void nanostructure

被引：1436

作者：

Almeida, VR ^{[1
]}

Xu, QF ^{[1
]}

Barrios, CA ^{[1
]}

Lipson, M ^{[1
]}

机构：

[1] Cornell Univ, Sch Elect & Comp Engn, Ithaca, NY 14853 USA

来源：

OPTICS LETTERS | 2004年 / 29卷 / 11期

关键词：

D O I：

10.1364/OL.29.001209

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We present a novel waveguide geometry for enhancing and confining light in a nanometer-wide low-index material. Light enhancement and confinement is caused by large discontinuity of the electric field at high-index-contrast interfaces. We show that by use of such a structure the field can be confined in a 50-nm-wide low-index region with a normalized intensity of 20 mum(-2). This intensity is approximately 20 times higher than what can be achieved in SiO2 with conventional rectangular waveguides. (C) 2004 Optical Society of America.

引用

页码：1209 / 1211

页数：3

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