Micromachined semi-encapsulated spiral inductors for microelectromechanical systems (MEMS) applications

被引:13
作者
Sadler, DJ [1 ]
Zhang, WJ [1 ]
Ahn, CH [1 ]
Kim, HJ [1 ]
Han, SH [1 ]
机构
[1] KOREAN INST TECHNOL & SCI,MAGNET ALLOY LAB,SEOUL,SOUTH KOREA
关键词
D O I
10.1109/20.617930
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Semi-encapsulated spiral inductors for microelectromechanical systems (MEMS) applications have been designed, fabricated, and characterized using micromachining and electroplating techniques. The inductors are fabricated on a Pyrex glass wafer using a simple three mask process and have an area of 4 mm by 4 mm. Devices consist of electroplated copper conductor lines with width 50 mu m, thickness 25 mu m, and spacing 30 mu m; they are semi-encapsulated with an electroplated Ni-Fe (81%/19%) magnetic core. At the low frequency of 10kHz, the inductance of the devices was measured as 1.5 mu H, while they exhibited a low resistance of only 3 ohms. Their low resistance and reasonably high inductance makes them ideal in MEMS applications as either sensors or actuators.
引用
收藏
页码:3319 / 3321
页数:3
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