Survey of critical failure events in on-chip interconnect by fault tree analysis

被引:3
|
作者
Yokogawa, Shinji [1 ]
Kunii, Kyousuke [2 ]
机构
[1] Univ Electrocommun, Infopowered Energy Syst Res Ctr, Chofu, Tokyo 1828585, Japan
[2] Univ Electrocommun, Grad Sch Informat & Engn, Chofu, Tokyo 1828585, Japan
关键词
COPPER INTERCONNECTS; VOID GROWTH; ELECTROMIGRATION; RELIABILITY; RESISTIVITY;
D O I
10.7567/JJAP.57.07MG01
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this paper, a framework based on reliability physics is proposed for adopting fault tree analysis (FTA) to the on-chip interconnect system of a semiconductor. By integrating expert knowledge and experience regarding the possibilities of failure on basic events, critical issues of on-chip interconnect reliability will be evaluated by FTA. In particular, FTA is used to identify the minimal cut sets with high risk priority. Critical events affecting the on-chip interconnect reliability are identified and discussed from the viewpoint of long-term reliability assessment. The moisture impact is evaluated as an external event. (C) 2018 The Japan Society of Applied Physics
引用
收藏
页数:7
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