Thermal Annealing Effects on the Characteristics of Transparent Semiconducting Zn2SnO4 Thin Films Prepared by RF-Magnetron Sputtering with Powder Target

被引:4
作者
Lee, Gyo Jung [1 ]
Lee, Do Kyung [2 ]
Sohn, Sang Ho [1 ]
机构
[1] Kyungpook Natl Univ, Dept Phys, Taegu 702701, South Korea
[2] Catholic Univ Daegu, Dept Adv Energy Mat Sci & Engn, Gyongsan 712702, Gyeongsangbuk D, South Korea
关键词
Powder target; thermal annealing; transparent thin film transistor; transparent semiconducting oxide; Zn2SnO4; OPTICAL-PROPERTIES;
D O I
10.1080/15421406.2013.853552
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Effects of thermal annealing on the structural, electrical and optical properties of transparent semiconducting Zn2SnO4(ZTO) thin films have been investigated. The ZTO thin film with the thickness of about 100nm is prepared by the RF-magnetron sputtering technique using powder target. The experimental results show that the ZTO films annealed at above 400 degrees C possess inverse cubic spinel structure with a preferred grain orientation in the (311) direction. The transmittances of the ZTO films are approximately 80% in visible region regardless annealing temperature. The increasing annealing temperature leads to the increase in Hall mobility and electron concentration, resulting in the decrease of resistivity. The optical band gap of the films increases with the increase of annealing temperature.
引用
收藏
页码:179 / 187
页数:9
相关论文
共 19 条
[1]   The structure and properties of chromium diboride coatings deposited by pulsed magnetron sputtering of powder targets [J].
Audronis, M ;
Kelly, PJ ;
Arnell, RD ;
Leyland, A ;
Matthews, A .
SURFACE & COATINGS TECHNOLOGY, 2005, 200 (5-6) :1366-1371
[2]   ANOMALOUS OPTICAL ABSORPTION LIMIT IN INSB [J].
BURSTEIN, E .
PHYSICAL REVIEW, 1954, 93 (03) :632-633
[3]   Influence of substrate temperature and post-treatment on the properties of ZnO:Al thin films prepared by pulsed laser deposition [J].
Chen, X ;
Guan, WJ ;
Fang, GJ ;
Zhao, XZ .
APPLIED SURFACE SCIENCE, 2005, 252 (05) :1561-1567
[4]   High mobility transparent thin-film transistors with amorphous zinc tin oxide channel layer [J].
Chiang, HQ ;
Wager, JF ;
Hoffman, RL ;
Jeong, J ;
Keszler, DA .
APPLIED PHYSICS LETTERS, 2005, 86 (01) :013503-1
[5]   High mobility and low threshold voltage transparent thin film transistors based on amorphous indium zinc oxide semiconductors [J].
Fortunato, E. ;
Barquinha, P. ;
Goncalves, G. ;
Pereira, L. ;
Martins, R. .
SOLID-STATE ELECTRONICS, 2008, 52 (03) :443-448
[6]   High mobility indium free amorphous oxide thin film transistors [J].
Fortunato, Elvira M. C. ;
Pereira, Lus M. N. ;
Barquinha, Pedro M. C. ;
do Rego, Ana M. Botelho ;
Goncalves, Goncalo ;
Vila, Anna ;
Morante, Juan R. ;
Martins, Rodrigo F. P. .
APPLIED PHYSICS LETTERS, 2008, 92 (22)
[7]   Stability of transparent zinc tin oxide transistors under bias stress [J].
Goerrn, P. ;
Hoelzer, P. ;
Riedl, T. ;
Kowalsky, W. ;
Wang, J. ;
Weimann, T. ;
Hinze, P. ;
Kipp, S. .
APPLIED PHYSICS LETTERS, 2007, 90 (06)
[8]   High-performance flexible zinc tin oxide field-effect transistors [J].
Jackson, WB ;
Hoffman, RL ;
Herman, GS .
APPLIED PHYSICS LETTERS, 2005, 87 (19) :1-3
[9]   Amorphous gallium indium zinc oxide thin film transistors: Sensitive to oxygen molecules [J].
Kang, Donghun ;
Lim, Hyuck ;
Kim, Changjung ;
Song, Ihun ;
Park, Jaechoel ;
Park, Youngsoo ;
Chung, JaeGwan .
APPLIED PHYSICS LETTERS, 2007, 90 (19)
[10]   Thermoelectric properties of nanoporous Ge [J].
Lee, Joo-Hyoung ;
Grossman, Jeffrey C. .
APPLIED PHYSICS LETTERS, 2009, 95 (01)