Microstructural characterisation of RF magnetron sputtered ZnO thin films on SiC

被引：1
|
作者：
Trinchi, A
Wlodarski, W
Santucci, S
Di Claudio, D
Passacantando, M
Cantalini, C
Rout, B
Ippolito, SJ
Kalantar-Zadeh, K
Sberveglieri, G
机构：
[1] RMIT Univ, Sch Elect & Comp Engn, Melbourne, Vic 3001, Australia
[2] Univ Aquila, Dept Phys, Unita INFM, Laquila, Italy
[3] Univ Laquila, Dept Chem & Mat, Laquila, Italy
[4] Univ Melbourne, Sch Phys, Microanal Res Ctr, Parkville, Vic 3052, Australia
[5] Univ Brescia, Dept Mat Chem & Phys, Brescia, Italy
来源：
FUNCTIONAL NANOMATERIALS FOR OPTOELECTRONICS AND OTHER APPLICATIONS | 2004年 / 99-100卷
关键词：
RBS; SiC; thin films; XPS; XRD; ZnO;
D O I：
10.4028/www.scientific.net/SSP.99-100.123
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The microstructural characterization of r.f. magnetron sputtered ZnO thin films deposited on 6H-SiC is presented with a comprehensive investigation of their properties as a function of annealing temperature and film thickness. These structures, with some modifications, are utilised as Schottky diode hydrogen gas sensors and Surface Acoustic Wave (SAW) devices.
引用
收藏
页码：123 / 126
页数：4
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