The influence of processing on properties and microstructure of Bi4-XLaXTi3O12 thin films

被引：0
|
作者：
Qin, HX [1 ]
Bao, ZH
Zhu, JS
Jin, ZQ
Wang, YN
机构：
[1] Nanjing Univ, Natl Lab Solid State Microstruct, Nanjing 210093, Peoples R China
[2] Nanjing Univ, Dept Phys, Nanjing 210093, Peoples R China
来源：
FERROELECTRICS | 2001年 / 261卷 / 1-4期
关键词：
Bi3.25La0.75Ti3O12 thin films; MOD; RF sputtering;
D O I：
暂无
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The Bi4-xLaxTi3O12 (x=0.75) thin films were prepared by RF magnetron sputtering and MOD techniques. The MOD-derived thin films show good ferroelectric properties and microstructure and the sputtered thin films have rougher surface and inhomogeneous microstructure.
引用
收藏
页码：723 / 728
页数：6
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