Fabrication of Freestanding Nanoporous Polythersulfone Membranes Using Organometallic Polymer Resists Patterned By Nanosphere Lighography

被引：35

作者：

Acikgoz, Canet ^{[1
]}

Ling, Xing Yi ^{[1
]}

Phang, In Yee

Hempenius, Mark A.

Reinhoudt, David N. ^{[1
]}

Huskens, Jurriaan ^{[1
]}

Vancso, G. Julius

机构：

[1] Univ Twente, Mol Nanofabricat Grp, MESA Inst Nanotechnol, NL-7500 AE Enschede, Netherlands

来源：

ADVANCED MATERIALS | 2009年 / 21卷 / 20期

关键词：

RING-OPENING POLYMERIZATION; BLOCK-COPOLYMERS; THIN-FILMS; LITHOGRAPHY; POLY(FERROCENYLSILANES); MONOLAYERS; SURFACES; ROUTE; STEP;

D O I：

10.1002/adma.200803647

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Freestanding nanoporous polysulfone membranes are fabricated using nanosphere lithography, in which colloidal silica particles act as a template for the organometallic etch resist, which is composed of poly (ferrocenylsi lanes). As shown in the figure, the membranes are robust enough to be removed from the silica wafers where they were produced. They can subsequently be used to separate particles of different sizes.

引用

页码：2064 / 2067

页数：4

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