The structural and magnetic properties of τ-MnAl films prepared by Mn/Al multilayers deposition plus annealing

被引：17
作者：
Duan, C. Y. [1 ,2 ]
Qiu, X. P. [3 ]
Ma, B. [1 ,2 ]
Zhang, Z. Z. [1 ,2 ]
Jin, Q. Y. [1 ,2 ]
机构：
[1] Fudan Univ, Adv Mat Lab, Key Lab Adv Photon Mat & Devices, Shanghai 200433, Peoples R China
[2] Fudan Univ, Dept Opt Sci & Engn, Shanghai 200433, Peoples R China
[3] Fudan Univ, Dept Phys, Shanghai 200433, Peoples R China
来源：
MATERIALS SCIENCE AND ENGINEERING B-ADVANCED FUNCTIONAL SOLID-STATE MATERIALS | 2009年 / 162卷 / 03期
关键词：
tau-MnAl; Interface; Multilayers; Annealing; THIN-FILMS; PHASE;
D O I：
10.1016/j.mseb.2009.04.005
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
The structural and magnetic properties of tau-MnAl alloy films are Studied. The films are derived by annealing from Mn/Al multilayers. tau-MnAl appears when the annealing temperature increases up to 350 degrees C, but decomposes into gamma(2)-MnAl and beta-Mn at 500 degrees C annealing. Good magnetic properties are obtained after 400-450 degrees C annealing. Furthermore. tau-MnAl forms in the Mn-Al interface. The saturation magnetization M-S increases first with the thickness of Mn (or Al) layers, and then decreases in inverse proportion to that of Mn (or Al) layers. The turning point implies that the thickness of tau-MnAl is no more than 5 nm in the Mn60Al40 films. (C) 2009 Elsevier B.V. All rights reserved.
引用
收藏
页码：185 / 188
页数：4
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