Humidity Degradation and Repair of ALD Al2O3 Passivated Silicon

被引:0
作者
Liang, Wensheng [1 ]
Weber, Klaus J. [1 ]
Suh, Dongchul [1 ]
Yu, Jun [1 ]
Bullock, James [1 ]
机构
[1] Australian Natl Univ, Ctr Sustainable Energy Syst, Canberra, ACT 0200, Australia
来源
2013 39TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), PT 2 | 2013年
关键词
Al2O3; passivation; humidity; FTIR; solar cell; EFFECTIVE SURFACE PASSIVATION; CRYSTALLINE SILICON; FILMS; SPECTROSCOPY; ALUMINA; OXIDE;
D O I
暂无
中图分类号
TE [石油、天然气工业]; TK [能源与动力工程];
学科分类号
0807 ; 0820 ;
摘要
The effect of humidity on boron diffused and undiffused silicon samples passivated by aluminum oxide (Al2O3) synthesized by plasma-assisted atomic layer deposition (PA-ALD) has been investigated. We found that undiffused samples show a higher degradation rate than diffused samples. Under an ambient of 100% relative humidity and 50 degrees C the lifetime of an undiffused sample passivated by Al2O3 decreased from 1500 to 400 mu s after 28 hours of exposure, whereas the saturation current density of the diffused region J(op+) of a boron diffused sample was nearly unchanged after 7 days of exposure. As expected, for both diffused and undiffused samples, the degradation rate is accelerated by increasing the temperature of the humidity environment. A PECVD SiNx capping layer acts as an effective protection layer for Al2O3 to resist a damp-heat conditions of 100% relatively humidity at 80 degrees C. The electrical resistance of PA-ALD Al2O3 was observed to degrade in humidity. Fourier Transform Infra-red Spectroscopy (FTIR) measurements indicate that damp heat results in a structural modification of the bulk Al2O3 film and the formation of AlO(OH). This change could be responsible for the fast degradation rate of PA-ALD Al2O3 passivation compared with SiO2. Finally, we experimentally demonstrated that the degraded passivation of an Al2O3 layer can be repaired by light illumination and negative corona charge deposition.
引用
收藏
页码:38 / 44
页数:7
相关论文
共 26 条
[1]  
[Anonymous], IEC61215
[2]   High efficiency n-type Si solar cells on Al2O3-passivated boron emitters [J].
Benick, Jan ;
Hoex, Bram ;
van de Sanden, M. C. M. ;
Kessels, W. M. M. ;
Schultz, Oliver ;
Glunz, Stefan W. .
APPLIED PHYSICS LETTERS, 2008, 92 (25)
[3]   Surface passivation of c-Si by atmospheric pressure chemical vapor deposition of Al2O3 [J].
Black, Lachlan E. ;
McIntosh, Keith R. .
APPLIED PHYSICS LETTERS, 2012, 100 (20)
[4]   Stability of Al2O3 and Al2O3/a-SiNx:H stacks for surface passivation of crystalline silicon [J].
Dingemans, G. ;
Engelhart, P. ;
Seguin, R. ;
Einsele, F. ;
Hoex, B. ;
van de Sanden, M. C. M. ;
Kessels, W. M. M. .
JOURNAL OF APPLIED PHYSICS, 2009, 106 (11)
[5]   Status and prospects of Al2O3-based surface passivation schemes for silicon solar cells [J].
Dingemans, Gijs ;
Kessels, Erwin .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2012, 30 (04)
[6]   Excellent passivation of highly doped p-type Si surfaces by the negative-charge-dielectric Al2O3 [J].
Hoex, B. ;
Schmidt, J. ;
Bock, R. ;
Altermatt, P. P. ;
van de Sanden, M. C. M. ;
Kessels, W. M. M. .
APPLIED PHYSICS LETTERS, 2007, 91 (11)
[7]   Silicon surface passivation by atomic layer deposited Al2O3 [J].
Hoex, B. ;
Schmidt, J. ;
Pohl, P. ;
van de Sanden, M. C. M. ;
Kessels, W. M. M. .
JOURNAL OF APPLIED PHYSICS, 2008, 104 (04)
[8]  
Kane D., 1985, IEEE photovoltaic specialists conference 18, V69, P578
[9]  
Klampaftis E., 2007, 22 EU PVSEC MIL IT, P889
[10]   IR SPECTROSCOPIC EVIDENCE FOR SURFACE VIBRATIONAL-MODES FORMED UPON DEHYDROXYLATION OF ALUMINA [J].
LAVALLEY, JC ;
BENAISSA, M .
JOURNAL OF THE CHEMICAL SOCIETY-CHEMICAL COMMUNICATIONS, 1984, (14) :908-909