MoS2-Sb2O3 film exhibiting better oxidation-resistance in atomic oxygen environment

被引:8
作者
Gao, Xiaoming [1 ]
Hu, Ming [1 ]
Fu, Yanlong [1 ]
Wang, Desheng [1 ]
Jiang, Dong [1 ]
Weng, Lijun [1 ]
Liu, Weimin [1 ]
Sun, Jiayi [1 ]
机构
[1] Chinese Acad Sci, Lanzhou Inst Chem Phys, State Key Lab Solid Lubricat, Lanzhou 730000, Gansu, Peoples R China
关键词
Physical vapour deposition; Thin films; Structural; Atomic oxygen; Oxidation; LOW-EARTH-ORBIT; MOS2; FILMS; LUBRICANTS; MICROSTRUCTURE; TRIBOLOGY;
D O I
10.1016/j.matlet.2018.02.093
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The microstructure and wear resistance of sputtered MoS2 films can be improved by adding some amount of metals. However, the oxidation-resistance of MoS2-metals films would be worried because some metals are sensitive to atomic oxygen (AO). In this paper, the inert Sb2O3 was introduced into the MoS2 film, and its effect on the structure and anti-oxidation ability of the MoS2 film was clarified. XRD and SEM results revealed that due to the addition of Sb2O3, the growth of MoS2 micro-platelets was almost suppressed, and so the composite film was amorphous and very compact. XPS analysis indicated that for the composite film, the influence by the AO irradiation was restricted into the film surface layer. Namely, the composite film exhibited a better anti-oxidation ability in the AO environment. (C) 2018 Elsevier B.V. All rights reserved.
引用
收藏
页码:212 / 215
页数:4
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