The near band-edge emission and photoconductivity response of phosphorus-doped ZnO thin films grown by pulsed laser deposition

被引:20
作者
Heo, YW [1 ]
Ip, K [1 ]
Pearton, SJ [1 ]
Norton, DP [1 ]
机构
[1] Univ Florida, Dept Mat Sci & Engn, Gainesville, FL 32611 USA
来源
PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE | 2004年 / 201卷 / 07期
关键词
D O I
10.1002/pssa.200306792
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The photo-response of phosphorus-doped ZnO thin films is reported. In particular, room temperature photoluminescence and ultraviolet photoconductivity are measured for epitaxial films grown by pulsed laser deposition. For the as-deposited films, the near band-edge emission in P-doped films is reduced in intensity and shifts to higher energy relative to the undoped materials. Annealing in 100 Torr of oxygen decreases the near band-edge photoluminescence intensity for both the undoped and P-doped material. However, an enhancement in the visible orange-red emission due to defect states in the gap is observed with oxygen annealing, which correlates with a decrease in conductivity. The visible luminescence is consistent with radiative recombination involving deep states. Ultraviolet photoconductivity is observed for the annealed films, and is most notable for the phosphorus-doped materials. These results are consistent with the phosphorus introducing a deep level in the gap that is heavily compensated by a defect-related shallow donor in the as-deposited films. (C) 2004 WILEY-VCH Verlag GmbH & Co. KGaA. Weinheim.
引用
收藏
页码:1500 / 1509
页数:10
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