Fabrication of high quality PZT thick film using lift-off technique

被引:0
作者
Zhao, HJ [1 ]
Ren, TL [1 ]
Liu, JS [1 ]
Liu, LT [1 ]
Li, ZJ [1 ]
机构
[1] Tsing Hua Univ, Inst Microelect, Beijing 100084, Peoples R China
来源
NANOTECH 2003, VOL 1 | 2003年
关键词
PZT; thick film; lift-off; SU-8; piezoelectric;
D O I
暂无
中图分类号
R318 [生物医学工程];
学科分类号
0831 ;
摘要
The present paper proposes a simple fabrication technique of the high quality lead-zirconate-titanate (PZT) thick films with a single coating and using a thick photoresist SU-8, which call for lift-off technique. The PZT films with the thickness of 100mum or higher were crack-free and had good morphology. The PZT films with perfect perovskite structure had excellent piezoelectric property and the d(33) was about 170pC/N. Ferroelectric hysteresis loop was measured, and the remnant polarization (P-r) of the PZT film was about 25muC/cm(2) and the coercive field (E-C) was about 27kV/cm. In the radio-frequency (RF) region, the dielectric constant was about 350 and the dielectric loss was less than 0.01.
引用
收藏
页码:502 / 505
页数:4
相关论文
共 4 条
  • [1] Fabrication of high-aspect-ratio PZT thick film structure using sol-gel technique and SU-8 photoresist
    Futai, N
    Matsumoto, K
    Shimoyama, I
    [J]. FIFTEENTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 2002, : 168 - 171
  • [2] MOILANEN H, 1993, P TRANSDUCERS 93, P166
  • [3] TAKAHASHI S, 1985, JPN J APPL PHYS S, V24, P41
  • [4] WANG SN, 1999, P TRANSDUCERS 99, P1762