We have carried out an extensive investigation on the resistance fluctuations (noise) in an epitaxial thin film of VO2 encompassing the metal-insulator transition (MIT) region to investigate the dynamic phase coexistence of metal and insulating phases. Both flicker noise as well as the Nyquist noise (thermal noise) were measured. The experiments showed that flicker noise, which has a 1/f spectral power dependence, evolves with temperature in the transition region following the evolution of the phase fractions and is governed by activated kinetics. Importantly, closer to the insulating end of the transition, when the metallic phase fraction is low, the magnitude of the noise shows an anomaly and a strong non-Gaussian component of noise develops. In this region, the local electron temperature (as measured through the Nyquist noise thermometry) shows a deviation from the equilibrium bath temperature. It is proposed that this behavior arises due to current crowding where a substantial amount of the current is carried through well separated small metallic islands leading to a dynamic correlated current path redistribution and an enhanced effective local current density. This leads to a non-Gaussian component to the resistance fluctuation and an associated local deviation of the electron temperature from the bath. Our experiment establishes that phase coexistence leads to a strong inhomogeneity in the region of MIT that makes the current transport strongly inhomogeneous and correlated.
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Hunt AG, 2001, PHILOS MAG B, V81, P875, DOI 10.1080/13642810110060133
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Univ Washington, Dept Phys, Seattle, WA 98195 USA
Univ Washington, Dept Chem, Seattle, WA 98195 USAUniv Washington, Dept Phys, Seattle, WA 98195 USA
Jones, Andrew C.
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Berweger, Samuel
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Cobden, David
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Raschke, Markus B.
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Univ Washington, Dept Phys, Seattle, WA 98195 USA
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Elect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
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Lee, Yong Wook
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Elect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
Choi, Sungyeoul
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Lim, Jung-Wook
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Elect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
Lim, Jung-Wook
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Yun, Sun Jin
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Elect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
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Shin, Tae-Ju
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Shin, Tae-Ju
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Pohang Univ Sci & Technol, Pohang Accelerator Lab, Pohang 790784, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
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Univ Washington, Dept Phys, Seattle, WA 98195 USA
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Jones, Andrew C.
;
Berweger, Samuel
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Univ Washington, Dept Chem, Seattle, WA 98195 USAUniv Washington, Dept Phys, Seattle, WA 98195 USA
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Wei, Jiang
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Univ Washington, Dept Phys, Seattle, WA 98195 USAUniv Washington, Dept Phys, Seattle, WA 98195 USA
Wei, Jiang
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Cobden, David
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Raschke, Markus B.
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Univ Washington, Dept Phys, Seattle, WA 98195 USA
Univ Washington, Dept Chem, Seattle, WA 98195 USAUniv Washington, Dept Phys, Seattle, WA 98195 USA
机构:
Elect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
Kim, Bong-Jun
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Lee, Yong Wook
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Elect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
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Choi, Sungyeoul
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Lim, Jung-Wook
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Yun, Sun Jin
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Elect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
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Kim, Hyun-Tak
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Elect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
Kim, Hyun-Tak
;
Shin, Tae-Ju
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Pohang Univ Sci & Technol, Pohang Accelerator Lab, Pohang 790784, South KoreaElect & Telecommun Res Inst, Met Insulator Transit Device Team, Taejon 305350, South Korea
Shin, Tae-Ju
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Yun, Hwa-Sick
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