NANOSTRUCTURE OF TiO2 THIN FILMS PREPARED BY UNBALANCED MAGNETRON SPUTTERING

被引：0

作者：

Pokaipisit, Artorn ^{[1
]}

Chaiyakun, Surasing ^{[2
]}

Limsuwan, Pichet ^{[2
]}

Ngotawornchai, Boonlaer ^{[3
]}

机构：

[1] Thailand Ctr Excellence Phys, Opt & Laser Lab, CHE, Bangkok 10400, Thailand

[2] King Mongkuts Univ Technol Thonburi, Fac Sci, Dept Phys, Bangkok 10140, Thailand

[3] Chulalongkorn Univ, Sci & Technol Res Equipment Ctr, Bangkok 10330, Thailand

来源：

INTERNATIONAL JOURNAL OF MODERN PHYSICS B | 2009年 / 23卷 / 10期

关键词：

Oxide; sputtering; atomic force microscopy; surface properties; LOW-TEMPERATURE DEPOSITION; PHOTOCATALYTIC ACTIVITY; PHASE-TRANSFORMATION; ANATASE; SURFACE; RUTILE;

D O I：

10.1142/S0217979209052297

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

In this study, titanium dioxide (TiO2) thin films were deposited on unheated glass substrates using an unbalanced magnetron sputtering system with different deposition times of 25, 35 and 45 min, respectively. The structure and surface morphology of TiO2 thin films were characterized by atomic force microscopy (AFM) and transmission electron microscopy (TEM) with selected-area electron diffraction (SAED). It was found that the crystallite size of TiO2 thin films was in the range of 10-20 nm, and the surface roughness was 1-3 nm. The SAED patterns show that the phase of TiO2 thin films obtained in this study is anatase phase.

引用

页码：2395 / 2403

页数：9

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