Low energy electron attachment by bromoalkanes

被引:13
作者
Barszczewska, W [1 ]
Kopyra, J [1 ]
Wnorowska, J [1 ]
Szamrej, I [1 ]
机构
[1] Univ Podlasie, Dept Chem, PL-08110 Siedlce, Poland
关键词
electron attachment; negative ions; electron swarms; halocarbons;
D O I
10.1016/j.ijms.2003.12.018
中图分类号
O64 [物理化学(理论化学)、化学物理学]; O56 [分子物理学、原子物理学];
学科分类号
070203 ; 070304 ; 081704 ; 1406 ;
摘要
Thermal electron attachment processes in the mixtures of CH3CH2CH2Br, CH3CHBrCH3, CH2BrCH2Br, CH2FCH2Br and CF3CH2Br with carbon dioxide have been investigated using an electron swarm method. It has been found that all the investigated compounds attach electrons only in a two-body process. Corresponding rate constants have been determined to be equal to 1.1 x 10(-11), 1.4 x 10(-12), 1.8 x 10(-8), 5 x 10(-11) and 1.4 x 10(-9) cm(3) molecule(-1)s(-1), respectively. The dependence of the electron capture rate constants on electronic polarizability of the accepting center of the molecule has been demonstrated. The average rate constant for CH3Br, CH3CH2Br and CH3CH2CH2Br equal to (6 +/- 2) x 10(-12)cm(3) molecule(-1)s(-1) is recommended. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:199 / 205
页数:7
相关论文
共 41 条
[1]   Dissociative electron attachment in chloroalkanes and the correlation with vertical attachment energies [J].
Aflatooni, K ;
Gallup, GA ;
Burrow, PD .
CHEMICAL PHYSICS LETTERS, 1998, 282 (5-6) :398-402
[2]   Total cross sections for dissociative electron attachment in dichloroalkanes and selected polychloroalkanes: The correlation with vertical attachment energies [J].
Aflatooni, K ;
Burrow, PD .
JOURNAL OF CHEMICAL PHYSICS, 2000, 113 (04) :1455-1464
[3]   Dissociative electron attachment in chlorofluoromethanes and the correlation with vertical attachment energies [J].
Aflatooni, K ;
Burrow, PD .
INTERNATIONAL JOURNAL OF MASS SPECTROMETRY, 2001, 205 (1-3) :149-161
[4]   ELECTRON-ATTACHMENT LINESHAPES, CROSS-SECTIONS AND RATE CONSTANTS AT ULTRA-LOW ENERGIES IN SEVERAL HALOMETHYL AND HALOETHYL MOLECULES [J].
ALAJAJIAN, SH ;
BERNIUS, MT ;
CHUTJIAN, A .
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1988, 21 (23) :4021-4033
[5]   RATE COEFFICIENTS FOR THE ATTACHMENT REACTIONS OF ELECTRONS WITH C-C7F14, CH3BR, CF3BR, CH2BR2 AND CH3I DETERMINED BETWEEN 200-K AND 600-K USING THE FALP TECHNIQUE [J].
ALGE, E ;
ADAMS, NG ;
SMITH, D .
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1984, 17 (18) :3827-3833
[6]  
[Anonymous], 1992, CRC HDB CHEM PHYS
[7]   ELECTRON DISAPPEARANCE IN PULSE IRRADIATED CH3CL, C2H5CL, CH3BR, AND C2H5BR [J].
BANSAL, KM ;
FESSENDEN, RW .
CHEMICAL PHYSICS LETTERS, 1972, 15 (01) :21-+
[8]   Low-energy electron attachment by chloroalkanes [J].
Barszczewska, W ;
Kopyra, J ;
Wnorowska, J ;
Szamrej, I .
JOURNAL OF PHYSICAL CHEMISTRY A, 2003, 107 (51) :11427-11432
[9]   Electron attachment processes in gas mixtures containing haloethanes [J].
Barszczewska, W ;
Rosa, A ;
Kopyra, J ;
Szamrej, I .
RESEARCH ON CHEMICAL INTERMEDIATES, 2001, 27 (7-8) :699-707
[10]   ELECTRON ATTACHMENT TO HALOGENATED ALIPHATIC HYDROCARBONS [J].
BLAUNSTE.RP ;
CHRISTOP.LG .
JOURNAL OF CHEMICAL PHYSICS, 1968, 49 (04) :1526-&