Layer number controllability of transition-metal dichalcogenides and the establishment of hetero-structures by using sulfurization of thin transition metal films
被引:17
作者:
Chen, Kuan-Chao
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机构:
Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
Acad Sinica, Res Ctr Appl Sci, Taipei 11529, TaiwanNatl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
Chen, Kuan-Chao
[1
,2
]
Chu, Tung-Wei
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机构:
Acad Sinica, Res Ctr Appl Sci, Taipei 11529, Taiwan
Natl Taiwan Univ, Grad Inst Photon & Optoelect, Taipei 10617, TaiwanNatl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
Chu, Tung-Wei
[2
,3
]
Wu, Chong-Rong
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机构:
Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
Acad Sinica, Res Ctr Appl Sci, Taipei 11529, TaiwanNatl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
Wu, Chong-Rong
[1
,2
]
Lee, Si-Chen
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机构:
Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, TaiwanNatl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
Lee, Si-Chen
[1
]
Lin, Shih-Yen
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机构:
Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
Acad Sinica, Res Ctr Appl Sci, Taipei 11529, TaiwanNatl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
Large-area and uniform MoS2 films are fabricated by using sulfurization of pre-deposited molybdenum (Mo) films. One-and three-layer MoS2 films are obtained by sulfurizing 0.5 and 1.0 nm Mo films, respectively. The results have demonstrated the good layer number controllability of this growth technique down to single-layer MoS2. By sequential sulfurization of 0.5 nm W, 0.5 nm Mo and 0.5 nm W under the same condition, three layers of the WS2/MoS2/WS2 hetero-structure are established, which has demonstrated the potential of this growth technique for the establishment of 2D crystal hetero-structures.
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Bolotin, K. I.
;
Sikes, K. J.
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h-index: 0
机构:
Columbia Univ, Dept Appl Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Sikes, K. J.
;
Jiang, Z.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Natl High Magnet Field Lab, Tallahassee, FL 32310 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Jiang, Z.
;
Klima, M.
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Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Klima, M.
;
Fudenberg, G.
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机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Fudenberg, G.
;
Hone, J.
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h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Hone, J.
;
Kim, P.
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h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Kim, P.
;
Stormer, H. L.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Cho, Byungjin
;
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机构:
Yoon, Jongwon
;
Lim, Sung Kwan
论文数: 0引用数: 0
h-index: 0
机构:
Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Gwangju 500712, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lim, Sung Kwan
;
Kim, Ah Ra
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kim, Ah Ra
;
Kim, Dong-Ho
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机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kim, Dong-Ho
;
Park, Sung-Gyu
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机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Park, Sung-Gyu
;
Kwon, Jung-Dae
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h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kwon, Jung-Dae
;
Lee, Young-Joo
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机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lee, Young-Joo
;
Lee, Kyu-Hwan
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h-index: 0
机构:
Korea Inst Mat Sci, Electrochem Dept, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lee, Kyu-Hwan
;
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机构:
Lee, Byoung Hun
;
Ko, Heung Cho
论文数: 0引用数: 0
h-index: 0
机构:
Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Gwangju 500712, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Ko, Heung Cho
;
Hahm, Myung Gwan
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Bolotin, K. I.
;
Sikes, K. J.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Appl Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Sikes, K. J.
;
Jiang, Z.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Natl High Magnet Field Lab, Tallahassee, FL 32310 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Jiang, Z.
;
Klima, M.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Klima, M.
;
Fudenberg, G.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Fudenberg, G.
;
Hone, J.
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h-index: 0
机构:
Columbia Univ, Dept Mech Engn, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Hone, J.
;
Kim, P.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
Kim, P.
;
Stormer, H. L.
论文数: 0引用数: 0
h-index: 0
机构:
Columbia Univ, Dept Phys, New York, NY 10027 USA
Columbia Univ, Dept Appl Phys, New York, NY 10027 USA
Alcatel Lucent Technol, Bell Labs, Murray Hill, NJ 07974 USAColumbia Univ, Dept Phys, New York, NY 10027 USA
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Cho, Byungjin
;
论文数: 引用数:
h-index:
机构:
Yoon, Jongwon
;
Lim, Sung Kwan
论文数: 0引用数: 0
h-index: 0
机构:
Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Gwangju 500712, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lim, Sung Kwan
;
Kim, Ah Ra
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kim, Ah Ra
;
Kim, Dong-Ho
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kim, Dong-Ho
;
Park, Sung-Gyu
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Park, Sung-Gyu
;
Kwon, Jung-Dae
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Kwon, Jung-Dae
;
Lee, Young-Joo
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lee, Young-Joo
;
Lee, Kyu-Hwan
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Electrochem Dept, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Lee, Kyu-Hwan
;
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h-index:
机构:
Lee, Byoung Hun
;
Ko, Heung Cho
论文数: 0引用数: 0
h-index: 0
机构:
Gwangju Inst Sci & Technol, Sch Mat Sci & Engn, Gwangju 500712, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea
Ko, Heung Cho
;
Hahm, Myung Gwan
论文数: 0引用数: 0
h-index: 0
机构:
Korea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South KoreaKorea Inst Mat Sci, Dept Adv Funct Thin Films, Surface Technol Div, Chang Won 642831, Gyeongnam, South Korea