Layer number controllability of transition-metal dichalcogenides and the establishment of hetero-structures by using sulfurization of thin transition metal films

被引:17
作者
Chen, Kuan-Chao [1 ,2 ]
Chu, Tung-Wei [2 ,3 ]
Wu, Chong-Rong [1 ,2 ]
Lee, Si-Chen [1 ]
Lin, Shih-Yen [1 ,2 ]
机构
[1] Natl Taiwan Univ, Grad Inst Elect Engn, Taipei 10617, Taiwan
[2] Acad Sinica, Res Ctr Appl Sci, Taipei 11529, Taiwan
[3] Natl Taiwan Univ, Grad Inst Photon & Optoelect, Taipei 10617, Taiwan
关键词
2D crystals; hetero-structure; transistors; MOS2; MONOLAYER; GRAPHENE; GROWTH;
D O I
10.1088/1361-6463/aa52b6
中图分类号
O59 [应用物理学];
学科分类号
摘要
Large-area and uniform MoS2 films are fabricated by using sulfurization of pre-deposited molybdenum (Mo) films. One-and three-layer MoS2 films are obtained by sulfurizing 0.5 and 1.0 nm Mo films, respectively. The results have demonstrated the good layer number controllability of this growth technique down to single-layer MoS2. By sequential sulfurization of 0.5 nm W, 0.5 nm Mo and 0.5 nm W under the same condition, three layers of the WS2/MoS2/WS2 hetero-structure are established, which has demonstrated the potential of this growth technique for the establishment of 2D crystal hetero-structures.
引用
收藏
页数:6
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