Optimizing drain current, inversion level, and channel length in analog CMOS design

被引:24
作者
Binkley, DM [1 ]
Blalock, BJ
Rochelle, JM
机构
[1] Univ N Carolina, Dept Elect & Comp Engn, Charlotte, NC 28223 USA
[2] Univ Tennessee, Dept Elect & Comp Engn, Knoxville, TN 37916 USA
[3] Concorde Microsyst Inc, Knoxville, TN 37932 USA
关键词
analog MOS; CMOS design; design methodology; optimization; weak; moderate; and strong inversion; MOS sizing; tiransconductance efficiency; early voltage; intrinsic voltage gain; intrinsic bandwidth; dc voltage and current mismatch; thermal and flicker noise; operational transconductance amplifier;
D O I
10.1007/s10470-006-2949-y
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
This paper describes a methodology for selecting drain current, inversion level (represented by inversion coefficient), and channel length for optimum performance tradeoffs in analog CMOS design. Here, inversion coefficient replaces width as a design choice to permit a conscious optimization of inversion level while width is implicitly considered. Transconductance, gate-referred thermal-noise voltage, and drain-source saturation voltage are optimized towards weak inversion while transconductance linearity and drain-referred thermal-noise current are optimized in strong inversion. Voltage gain, flicker noise, and dc mismatch are optimized towards weak inversion at long channel length while bandwidth is optimized in strong inversion at short channel length. Optimization expressions are given along with measured transconductance efficiency and Early voltage from weak through strong inversion over a wide range of channel lengths. Transconductance efficiency and Early voltage are used as normalized measures of transconductance and drain-source resistance, independent of drain current. The methodology presented is used to design three 0.5-mu m operational transconductance amplifiers having equal 50-mu A bias currents, but different tradeoffs in gain, bandwidth, noise, and dc mismatch. The amplifiers have measured voltage gains of 16.8, 110, and 326 V/V, -3-dB bandwidths of 350, 5 1, and 5 MHz, input-referred flicker-noise voltage at 100 Hz of 2,000, 450, and 58 nV/Hz(1/2), and input-referred dc mismatch voltages of 10.2, 2.2, and 1.1 mV respectively. The design methodology can be readily extended to deeper submicron CMOS processes.
引用
收藏
页码:137 / 163
页数:27
相关论文
共 169 条
[1]   HIGH-FREQUENCY NOISE MEASUREMENTS ON FETS WITH SMALL DIMENSIONS [J].
ABIDI, AA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1986, 33 (11) :1801-1805
[2]   1/f noise measurements in n-channel MOSFETs processed in 0.25 μm technology -: Extraction of BSIM3v3 noise parameters [J].
Allogo, YA ;
de Murcia, M ;
Vildeuil, JC ;
Valenza, M ;
Llinares, P ;
Cottin, D .
SOLID-STATE ELECTRONICS, 2002, 46 (03) :361-366
[3]   Noise characterization of a 0.25 μm CMOS technology for the LHC experiments [J].
Anelli, G ;
Faccio, F ;
Florian, S ;
Jarron, P .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION A-ACCELERATORS SPECTROMETERS DETECTORS AND ASSOCIATED EQUIPMENT, 2001, 457 (1-2) :361-368
[4]  
[Anonymous], 1996, MIXED ANALOG DIGITAL
[5]   WiCkeD: Analog circuit synthesis incorporating mismatch [J].
Antreich, K ;
Eckmueller, J ;
Graeb, H ;
Pronath, M ;
Schenkel, F ;
Schwencker, R ;
Zizala, S .
PROCEEDINGS OF THE IEEE 2000 CUSTOM INTEGRATED CIRCUITS CONFERENCE, 2000, :511-514
[6]   LOW 1/F NOISE DESIGN OF HI-CMOS DEVICES [J].
AOKI, M ;
SAKAI, Y ;
MASUHARA, T .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1982, 29 (02) :296-299
[7]   LOW-FREQUENCY 1-F NOISE IN MOSFETS AT LOW CURRENT LEVELS [J].
AOKI, M ;
KATTO, H ;
YAMADA, E .
JOURNAL OF APPLIED PHYSICS, 1977, 48 (12) :5135-5140
[8]   Consistent noise models for analysis and design of CMOS circuits [J].
Arnaud, A ;
Galup-Montoro, C .
IEEE TRANSACTIONS ON CIRCUITS AND SYSTEMS I-REGULAR PAPERS, 2004, 51 (10) :1909-1915
[9]   Low-frequency noise in near-fully-depleted TFSOI MOSFET's [J].
Babcock, JA ;
Schroder, DK ;
Tseng, YC .
IEEE ELECTRON DEVICE LETTERS, 1998, 19 (02) :40-43
[10]  
Bastos J, 1996, ICMTS 1996 - 1996 IEEE INTERNATIONAL CONFERENCE ON MICROELECTRONIC TEST STRUCTURES, PROCEEDINGS, P17, DOI 10.1109/ICMTS.1996.535615