Additive lithography for fabrication of diffractive optics

被引：23

作者：

Pitchumani, M ^{[1
]}

Hockel, H ^{[1
]}

Mohammed, W ^{[1
]}

Johnson, EG ^{[1
]}

机构：

[1] Univ Cent Florida, Sch Opt, Ctr Res & Educ Opt & Lasers, Orlando, FL 32816 USA

来源：

APPLIED OPTICS | 2002年 / 41卷 / 29期

关键词：

D O I：

10.1364/AO.41.006176

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

An innovative fabrication technique is introduced that is based on multiple-exposure techniques for micro-optics fabrication. This method utilizes various exposure times and combinations of binary and analog photo masks to sculpture complex photoresist profiles. It also demonstrates the fabrication of analog structures from the multilevel structures thus formed by using resist reflow.

引用

页码：6176 / 6181

页数：6

共 11 条

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