Nanoscale chemical and topological imaging of block copolymers with photo-induced force microscopy

被引：0
|
作者：
Nowak, Derek [2 ]
Morrison, William [2 ]
Park, Sung [2 ]
Schmidt, Kristin [1 ]
Frommer, Jane [1 ]
Sanders, Dan [1 ]
机构：
[1] IBM Almaden Res Ctr, San Jose, CA USA
[2] Mol Vista, San Jose, CA USA
来源：
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 2016年 / 251卷
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D O I：
暂无
中图分类号：
O6 [化学];
学科分类号：
0703 ;
摘要：
548
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页数：2
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