Reduced chemistries with the Quantemol database (QDB)

被引:5
作者
Ayilaran, Adetokunbo [1 ]
Hanicinec, Martin [2 ]
Mohr, Sebastian [1 ]
Tennyson, Jonathan [2 ]
机构
[1] Quantemol Ltd, 320 City Rd, London EC1V 2NZ, England
[2] UCL, Dept Phys & Astron, London WC1E 6BT, England
关键词
plasma chemistries; quantemol database; chemical reactions; chemistry reduction; stoichiometry; ELECTRON COLLISIONS;
D O I
10.1088/2058-6272/ab00a1
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Typical feed gas mixtures used in technological and other plasmas may give rise to reaction networks involving several hundred reactions. Such chemistries are often too large to be used in full reactor simulations and it is therefore desirable to construct reduced chemistry networks which mimic as closely as possible the behavior of the full chemistry but employ far fewer individual reactions and species. Constructed chemistries are available from the Quantemol database (QDB) and two approaches to constructing reduced chemistry from these chemistries based on (a) physical intuition and (b) sensitivity analysis of dominant reaction pathways, are explored. In doing this it is necessary to consider different pressure and power regimes. Reduced chemistry sets are presented for CF4/O-2/N-2/H-2, for which 396 reactions and 52 species are reduced to 71 reactions and 26 species, and for pure O-2, for which 45 reactions and 10 species are reduced to 34 reactions.
引用
收藏
页数:14
相关论文
共 34 条
  • [1] The 2017 Plasma Roadmap: Low temperature plasma science and technology
    Adamovich, I.
    Baalrud, S. D.
    Bogaerts, A.
    Bruggeman, P. J.
    Cappelli, M.
    Colombo, V.
    Czarnetzki, U.
    Ebert, U.
    Eden, J. G.
    Favia, P.
    Graves, D. B.
    Hamaguchi, S.
    Hieftje, G.
    Hori, M.
    Kaganovich, I. D.
    Kortshagen, U.
    Kushner, M. J.
    Mason, N. J.
    Mazouffre, S.
    Thagard, S. Mededovic
    Metelmann, H-R
    Mizuno, A.
    Moreau, E.
    Murphy, A. B.
    Niemira, B. A.
    Oehrlein, G. S.
    Petrovic, Z. Lj
    Pitchford, L. C.
    Pu, Y-K
    Rauf, S.
    Sakai, O.
    Samukawa, S.
    Starikovskaia, S.
    Tennyson, J.
    Terashima, K.
    Turner, M. M.
    van de Sanden, M. C. M.
    Vardelle, A.
    [J]. JOURNAL OF PHYSICS D-APPLIED PHYSICS, 2017, 50 (32)
  • [2] Electron collisions with atoms, ions, molecules, and surfaces: Fundamental science empowering advances in technology
    Bartschat, Klaus
    Kushner, Mark J.
    [J]. PROCEEDINGS OF THE NATIONAL ACADEMY OF SCIENCES OF THE UNITED STATES OF AMERICA, 2016, 113 (26) : 7026 - 7034
  • [3] ELECTRON-IMPACT CROSS-SECTION DATA FOR CARBON TETRAFLUORIDE
    BONHAM, RA
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1994, 33 (7B): : 4157 - 4164
  • [4] Uncertainty and sensitivity, analysis of gas-phase chemistry in a CHF3 plasma
    Bose, D
    Rao, MVVS
    Govindan, TR
    Meyyappan, M
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2003, 12 (02) : 225 - 234
  • [5] Atomic and molecular data for spacecraft re-entry plasmas
    Celiberto, R.
    Armenise, I.
    Cacciatore, M.
    Capitelli, M.
    Esposito, F.
    Gamallo, P.
    Janev, R. K.
    Lagana, A.
    Laporta, V.
    Laricchiuta, A.
    Lombardi, A.
    Rutigliano, M.
    Sayos, R.
    Tennyson, J.
    Wadehra, J. M.
    [J]. PLASMA SOURCES SCIENCE & TECHNOLOGY, 2016, 25 (03)
  • [6] Electron interactions with CF4
    Christophorou, LG
    Olthoff, JK
    Rao, MVVS
    [J]. JOURNAL OF PHYSICAL AND CHEMICAL REFERENCE DATA, 1996, 25 (05) : 1341 - 1388
  • [7] DRY-ETCHING OF TITANIUM NITRIDE THIN-FILMS IN CF4-O-2 PLASMAS
    FRACASSI, F
    DAGOSTINO, R
    LAMENDOLA, R
    MANGIERI, I
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1995, 13 (02): : 335 - 342
  • [8] Hayashi M, 1990, NONEQUILIBRIUM PROCE, V1990, P333
  • [9] Hayashi M., 1979, J PHYS C SOLID STATE, V40, pC2, DOI [10.1051/jphyscol:1979722, DOI 10.1051/JPHYSCOL:1979722]
  • [10] Holdship J, 2018, ASTROPHYS J, V116, P866