A Light-Impact Model for p-Type and n-Type Poly-Si TFTs

被引:4
作者
Papadopoulos, Nikolas P. [1 ]
Hatzopoulos, Alkis A. [1 ]
Papakostas, Dimitris K. [2 ]
Picos, Rodrigo [3 ]
Dimitriadis, Charalabos A. [4 ]
Siskos, Stylianos [5 ]
机构
[1] Aristotle Univ Thessaloniki, Elect Lab, Dept Elect & Comp Engn, Thessaloniki 54124, Greece
[2] Alexander Technol & Educ Inst Thessaloniki, Dept Elect, Thessaloniki 57400, Greece
[3] Univ Illes Balears, Dept Fis, Baleares 07122, Spain
[4] Aristotle Univ Thessaloniki, Dept Phys, Microelect Device Characterizat & Design Lab, Thessaloniki 54124, Greece
[5] Aristotle Univ Thessaloniki, Dept Phys, Elect Lab, Thessaloniki 54124, Greece
来源
JOURNAL OF DISPLAY TECHNOLOGY | 2009年 / 5卷 / 07期
关键词
Light; optical; influence; impact; I-V modeling; polysilicon thin-film transistors (poly-Si TFTs); p-type; n-type; SPICE; THIN-FILM TRANSISTORS; POLYCRYSTALLINE SILICON; SOLAR ILLUMINATION; GRAIN-BOUNDARIES; SEMICONDUCTORS; MOBILITY;
D O I
10.1109/JDT.2009.2015898
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
This paper introduces and verifies a new light-impact model (LIM) for both p-type and n-type polycrystalline thin-film transistors (poly-Si TFTs). The ratio of the produced current under a specific light intensity (I-d) over the dark current (I-dark) is calculated. The new model has been also implemented in the circuit simulation program HSPICE. Comparative results between measurements and simulated characteristics are presented for different sizes of widths/lengths, different values of the V-ds and V-gs voltages and of light intensities.
引用
收藏
页码:265 / 272
页数:8
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