Nanocrystalline gamma alumina coatings by inverted cylindrical magnetron sputtering

被引:70
作者
Khanna, Atul [1 ]
Bhat, Deepak G. [1 ]
机构
[1] Univ Arkansas, Dept Mech Engn, Fayetteville, AR 72701 USA
基金
美国国家科学基金会;
关键词
alumina coatings; inverted cylindrical magnetrons; AC sputtering;
D O I
10.1016/j.surfcoat.2005.11.109
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Alumina coatings were deposited on glass, silicon and stainless steel substrates by magnetron sputtering of two cylindrical aluminum targets in argon-oxygen plasma using a mid frequency AC power supply operated at 41 kHz and 5 M No substrate heating was used during the deposition process. Reactive sputtering was carried out in the poisoned mode of the targets at low deposition rates of about 0.09 nm s(-1). The coatings were characterized by X-ray diffraction studies and found to be nano-crystalline, gamma-phase of aluminum oxide. The coatings thickness was measured using the optical interference effects in the UV-visible spectrum of thin films deposited on glass substrates. Thin film thickness after 4 h of reactive sputtering was found to be 1.3 mu m. We further studied the oxidation resistance of the alumina coatings produced on stainless steel substrates at a temperature of 400 degrees C. Coatings were found to be completely stable at this temperature and prevented the oxidation of underlying stainless steel substrate. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:168 / 173
页数:6
相关论文
共 55 条
[1]   PVD-Al2O3-coated cemented carbide cutting tools [J].
Åstrand, M ;
Selinder, TI ;
Fietzke, F ;
Klosterman, H .
SURFACE & COATINGS TECHNOLOGY, 2004, 188 (1-3 SPEC.ISS.) :186-192
[2]  
Bae YW, 1998, J AM CERAM SOC, V81, P1945, DOI 10.1111/j.1151-2916.1998.tb02572.x
[3]  
Bunshah R.F., 2001, HDB HARD COATINGS
[4]  
Chateld C., 1989, J PHYS C SOLID STATE, V5, P1607
[5]   Preparation of α-alumina coated carbide tools by the sol-gel process [J].
Chen, YC ;
Ai, X ;
Huang, CZ ;
Wang, BY .
MATERIALS SCIENCE AND ENGINEERING A-STRUCTURAL MATERIALS PROPERTIES MICROSTRUCTURE AND PROCESSING, 2000, 288 (01) :19-25
[6]   Comparative characterization of alumina coatings deposited by RF, DC and pulsed reactive magnetron sputtering [J].
Cremer, R ;
Witthaut, M ;
Neuschütz, D ;
Erkens, G ;
Leyendecker, T ;
Feldhege, M .
SURFACE & COATINGS TECHNOLOGY, 1999, 120 :213-218
[7]   TRANSITIONS IN VAPOR-DEPOSITED ALUMINA FROM 300 DEGREES TO 1200 DEGREES C [J].
DRAGOO, AL ;
DIAMOND, JJ .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1967, 50 (11) :568-&
[8]   Alumina coatings by plasma spraying of monosize sapphire particles [J].
Erickson, LC ;
Troczynski, T ;
Hawthorne, HM ;
Tai, H ;
Ross, D .
JOURNAL OF THERMAL SPRAY TECHNOLOGY, 1999, 8 (03) :421-426
[9]  
ERKENS G, 2002, ICMCTF C P SAN DIEG
[10]   STRUCTURAL CHARACTERIZATION OF ALUMINA METASTABLE PHASES IN PLASMA SPRAYED DEPOSITS [J].
FARGEOT, D ;
MERCURIO, D ;
DAUGER, A .
MATERIALS CHEMISTRY AND PHYSICS, 1990, 24 (03) :299-314