机构:
Univ Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, SpainUniv Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, Spain
Oliveira, L.
[1
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Todorov, T.
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Univ Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, SpainUniv Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, Spain
Todorov, T.
[1
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Chassaing, E.
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机构:
IRDEP, F-78401 Chatou, FranceUniv Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, Spain
Chassaing, E.
[2
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LinCot, D.
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机构:
IRDEP, F-78401 Chatou, FranceUniv Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, Spain
LinCot, D.
[2
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Carda, J.
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Univ Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, SpainUniv Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, Spain
Carda, J.
[1
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Escribano, P.
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Univ Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, SpainUniv Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, Spain
Escribano, P.
[1
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机构:
[1] Univ Jaume 1, Organ & Inorgan Chem Dept, Castellon De La Plana 12071, Spain
Homogeneous layers of amorphous oxides of Cu-In, Cu-In-Ga were deposited by a sol-gel method. Selenization, sulfurization and sequential selenization + sulfurization treatments were performed with elemental S and Se, respectively. Adherent pinhole-free layers were observed by scanning electron microscopy. X-ray diffraction indicated increased gallium incorporation in selenized in comparison with sulfurized films. Band gap values in the range of 1.18-1.63 eV were obtained. (C) 2008 Elsevier B.V. All rights reserved.