Methods of simulating thin film deposition using spray pyrolysis techniques

被引:39
作者
Filipovic, Lado [1 ]
Selberherr, Siegfried [1 ]
Mutinati, Giorgio C. [2 ]
Brunet, Elise [2 ]
Steinhauer, Stephan [2 ]
Koeck, Anton [2 ]
Teva, Jordi [3 ]
Kraft, Jochen [3 ]
Siegert, Joerg [3 ]
Schrank, Franz [3 ]
机构
[1] TU Wien, Inst Microelect, A-1040 Vienna, Austria
[2] AIT GmbH, Mol Diagnost Hlth & Environm, A-1220 Vienna, Austria
[3] Ams AG, A-8141 Unterpremstatten, Austria
关键词
Spray pyrolysis deposition; Tin oxide film; Topography simulation; Level Set; Smart gas sensors; SENSORS; TRANSPARENT; LAYERS;
D O I
10.1016/j.mee.2013.12.025
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Integration of thin tin oxide film formation into CMOS technology is a fundamental step to realize sensitive smart gas sensor devices. Spray pyrolysis is a deposition technique which has the potential to fulfil this requirement. A model for spray pyrolysis deposition is developed and implemented within a Level Set framework. Two models for the topography modification due to spray pyrolysis deposition are presented, with an electric and a pressure atomizing nozzle. The resulting film growth is modeled as a layer by layer deposition of the individual droplets which reach the wafer surface or as a CVD-like process, depending on whether the droplets form a vapor near the interface or if they deposit a film only after surface collision. (C) 2013 Elsevier B.V. All rights reserved.
引用
收藏
页码:57 / 66
页数:10
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