On the electron energy in the high power impulse magnetron sputtering discharge

被引：80

作者：

Gudmundsson, J. T. ^{[1
,2
]}

Sigurjonsson, P. ^{[1
,2
]}

Larsson, P. ^{[3
]}

Lundin, D. ^{[3
]}

Helmersson, U. ^{[3
]}

机构：

[1] Univ Iceland, Inst Sci, IS-107 Reykjavik, Iceland

[2] Univ Iceland, Dept Elect & Comp Engn, IS-107 Reykjavik, Iceland

[3] Linkoping Univ, IFM Mat Phys, Plasma & Coatings Div, SE-58183 Linkoping, Sweden

来源：

JOURNAL OF APPLIED PHYSICS | 2009年 / 105卷 / 12期

关键词：

PLASMA PARAMETERS;

D O I：

10.1063/1.3151953

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The temporal variation of the electron energy distribution function (EEDF) was measured with a Langmuir probe in a high power impulse magnetron sputtering (HiPIMS) discharge at 3 and 20 mTorr pressures. In the HiPIMS discharge a high power pulse is applied to a planar magnetron giving a high electron density and highly ionized sputtered vapor. The measured EEDF is Maxwellian-like during the pulse; it is broader for lower discharge pressure and it becomes narrower as the pulse progresses. This indicates that the plasma cools as the pulse progresses, probably due to high metal content of the discharge. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3151953]

引用

页数：3

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