An initial analysis of mechanisms leading to late stage abnormal grain growth in nanocrystalline Ni

被引：123
作者：
Hibbard, GD
McCrea, JL
Palumbo, G
Aust, KT
Erb, U
机构：
[1] Univ Toronto, Dept Mat Sci & Engn, Toronto, ON M5S 3E4, Canada
[2] Integran Technol Inc, Toronto, ON M9W 4Z6, Canada
来源：
SCRIPTA MATERIALIA | 2002年 / 47卷 / 02期
基金：
加拿大自然科学与工程研究理事会;
关键词：
grain growth; segregation; nickel; nanostructured materials;
D O I：
10.1016/S1359-6462(02)00098-2
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A late stage of abnormal grain growth, having unusual planar abnormal growth interfaces, is observed during the isothermal annealing of electrodeposited nanocrystalline Ni and Ni-Fe alloys. This communication presents observations of grain embedding and the presence of a wetting, sulfur-rich second phase at the abnormal growth interface and suggests a growth mechanism. (C) 2002 Acta Materialia Inc. Published by Elsevier Science Ltd. All rights reserved.
引用
收藏
页码：83 / 87
页数：5
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