Figuring with subnanometer-level accuracy by numerically controlled elastic emission machining

被引:225
作者
Yamauchi, K [1 ]
Mimura, H [1 ]
Inagaki, K [1 ]
Mori, Y [1 ]
机构
[1] Osaka Univ, Grad Sch Engn, Dept Precis Sci & Technol, Suita, Osaka 5650871, Japan
关键词
D O I
10.1063/1.1510573
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
A numerically controlled elastic emission machining (EEM) system has been developed to fabricate ultraprecise optical components, particularly in x-ray optics. Nozzle-type EEM heads, by which a high shear-rate flow of ultrapure water can be generated on the work surface, have been newly proposed to transport the fine powder particles to the processing surface. Using this type of EEM head, the obtainable spatial resolution in figure correction can be changed by selecting the suitable aperture size of the nozzle according to the required spatial frequency. As a result of test figuring, 1 nm level peak-to-valley (p-v) accuracy is achieved throughout the entire spatial wavelength range longer than 0.3 mm. In addition, the microroughness of the processed surface is certified to also be approximately 1 nm (p-v). (C) 2002 American Institute of Physics.
引用
收藏
页码:4028 / 4033
页数:6
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