Ion temperature and fluctuation in a large-diameter electron-cyclotron-resonance plasma

被引:6
作者
Koga, M [1 ]
Yoshizawa, T
Ueda, Y
Yonesu, A
Kawai, Y
机构
[1] Kyushu Univ, Interdisciplinary Grad Sch Engn Sci, Kasuga, Fukuoka 8168580, Japan
[2] Univ Ryukyus, Dept Elect & Elect Engn, Fac Engn, Nishihara, Okinawa 9030213, Japan
关键词
ECR plasma; ion temperature; optical emission spectroscopy; fluctuation;
D O I
10.1016/S0042-207X(02)00139-2
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Using high-resolution optical emission spectroscopy, Ar+ ion temperature in a large-diameter electron cyclotron resonance (ECR) plasma was obtained from Doppler broadenings. It was found that the ion temperature depends on gas pressures and incident microwave powers. The ion temperature at low-pressures was considerably high. When the gas pressure was decreased from 13.0 x 10(-2) to 2.6 x 10(-2) Pa for the incident microwave power of 2.0 kW, the ion temperature increased from 0.03 to 0.56 eV. The amplitude of fluctuations observed in the ECR plasma also increased with decreasing the gas pressure and increasing the incident microwave power. These results suggest that there is a correlation between the ion temperature and fluctuations. The fluctuations were excited by the flute instability. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:329 / 334
页数:6
相关论文
共 14 条
[1]  
CHEN FF, 1974, INTRO PLASMA PHYSICS
[2]  
FOSRTER J, 1992, J VAC SCI TECHNOL, V103, P114
[3]   COLD AND LOW-ENERGY ION ETCHING (COLLIE) [J].
FUJIWARA, N ;
SHIBANO, T ;
NISHIOKA, K ;
KATO, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1989, 28 (10) :2147-2150
[4]   ION ENERGETICS IN ELECTRON-CYCLOTRON RESONANCE DISCHARGES [J].
HOLBER, WM ;
FORSTER, J .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1990, 8 (05) :3720-3725
[5]   Measurements of ECR silane plasma parameters [J].
Kawai, Y ;
Ueda, Y ;
Morimoto, M ;
Hiejima, S ;
Katsumata, I .
JOURNAL OF MATERIALS PROCESSING TECHNOLOGY, 1999, 93 :230-234
[6]   Broadening of the parallel and perpendicular ion energy spectrum and correlation with turbulent potential fluctuations in a linear magnetized plasma [J].
Luckhardt, SC ;
Harvey, RW ;
Batishchev, OV ;
Batishcheva, AA ;
Cuthbertson, J ;
Doerner, R ;
Grossman, A ;
Lehmer, R ;
Blush, L ;
Whyte, DG .
JOURNAL OF NUCLEAR MATERIALS, 1999, 266 :1285-1289
[7]   LOW-TEMPERATURE CHEMICAL VAPOR-DEPOSITION METHOD UTILIZING AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].
MATSUO, S ;
KIUCHI, M .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1983, 22 (04) :L210-L212
[8]   DOPPLER PROFILE MEASUREMENT OF AR AND AR+ TRANSLATIONAL ENERGIES IN A DIVERGENT MAGNETIC-FIELD ELECTRON-CYCLOTRON RESONANCE SOURCE [J].
MCKILLOP, JS ;
FORSTER, JC ;
HOLBER, WM .
APPLIED PHYSICS LETTERS, 1989, 55 (01) :30-32
[9]   MICROWAVE ION-SOURCE [J].
SAKUDO, N ;
TOKIGUCHI, K ;
KOIKE, H ;
KANOMATA, I .
REVIEW OF SCIENTIFIC INSTRUMENTS, 1977, 48 (07) :762-766
[10]   ION CURRENT-DENSITY AND ION ENERGY-DISTRIBUTIONS AT THE ELECTRON-CYCLOTRON RESONANCE POSITION IN THE ELECTRON-CYCLOTRON RESONANCE PLASMA [J].
SAMUKAWA, S ;
NAKAGAWA, Y ;
IKEDA, K .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1991, 30 (02) :423-427