The electrochemical behavior of bleomycin at a Co/GC ion implantation modified electrode

被引：0

作者：

Hu, JB ^{[1
]}

Li, QL ^{[1
]}

机构：

[1] Beijing Normal Univ, Dept Chem, Beijing 100875, Peoples R China

来源：

CHINESE CHEMICAL LETTERS | 1999年 / 10卷 / 10期

关键词：

ion implantation; electrochemical behavior; bleomycin;

D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

In 0.10 mol/L HOAc-NaOAc buffer solution (pH 4.59). a sensitive reduction peak of bleomycin is obtained by linear sweep voltammetry at Co/GC ion implantation modified electrode. Its electrochemical behavior has been studied. The experiments of AES and XPS show that Co is surely implanted into the surface of GCE and improved the electrocatalytic activity.

引用

页码：855 / 856

页数：2