Self-heating and kink effects in a-Si:H thin film transistors

被引:50
|
作者
Wang, L [1 ]
Fjeldly, TA
Iniguez, B
Slade, HC
Shur, M
机构
[1] Philips Res, Briarcliff Manor, NY 10510 USA
[2] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
[3] Univ Catholique Louvain, Microelect Lab, B-1348 Louvain, Belgium
[4] White Oak Semicond, Technol Transfer Dept, Sandston, VA 23150 USA
[5] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
关键词
amorphous silicon; circuit simulation; device modeling; kink effect; self heating; SHE; short channel effects; TFT; thermal resistance; thin-film transistor;
D O I
10.1109/16.822285
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We describe a new physics based, analytical de model accounting for short channel effects for hydrogenated amorphous silicon (a Si:H) thin film transistors (TFT's), This model is based on the long channel device model. Two important short-channel phenomena, self-heating and kink effect, are analyzed in detail. For self-heating effect, a thermal kinetic analysis is carried out and a physical model and an equivalent circuit are used to estimate the thermal resistance of the device. In deriving the analytical model for self-heating effect, a first order approximation and self-consistency are used to give an iteration-free model accurate for a temperature rise of,up to 100 degrees C. In the modeling of the kink effects, a semi-empirical approach is used based on the physics involved. The combined model accurately reproduces the de characteristics of a-Si:H TFT's with a gate length of the 4 mu m. Predictions for a-Si:PI TFT's scaled down to 1 mu m are also provided, The model is suitable for use in device and circuit simulators.
引用
收藏
页码:387 / 397
页数:11
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