Self-heating and kink effects in a-Si:H thin film transistors

被引:50
|
作者
Wang, L [1 ]
Fjeldly, TA
Iniguez, B
Slade, HC
Shur, M
机构
[1] Philips Res, Briarcliff Manor, NY 10510 USA
[2] Rensselaer Polytech Inst, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
[3] Univ Catholique Louvain, Microelect Lab, B-1348 Louvain, Belgium
[4] White Oak Semicond, Technol Transfer Dept, Sandston, VA 23150 USA
[5] Rensselaer Polytech Inst, Ctr Integrated Elect & Elect Mfg, Troy, NY 12180 USA
关键词
amorphous silicon; circuit simulation; device modeling; kink effect; self heating; SHE; short channel effects; TFT; thermal resistance; thin-film transistor;
D O I
10.1109/16.822285
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We describe a new physics based, analytical de model accounting for short channel effects for hydrogenated amorphous silicon (a Si:H) thin film transistors (TFT's), This model is based on the long channel device model. Two important short-channel phenomena, self-heating and kink effect, are analyzed in detail. For self-heating effect, a thermal kinetic analysis is carried out and a physical model and an equivalent circuit are used to estimate the thermal resistance of the device. In deriving the analytical model for self-heating effect, a first order approximation and self-consistency are used to give an iteration-free model accurate for a temperature rise of,up to 100 degrees C. In the modeling of the kink effects, a semi-empirical approach is used based on the physics involved. The combined model accurately reproduces the de characteristics of a-Si:H TFT's with a gate length of the 4 mu m. Predictions for a-Si:PI TFT's scaled down to 1 mu m are also provided, The model is suitable for use in device and circuit simulators.
引用
收藏
页码:387 / 397
页数:11
相关论文
共 50 条
  • [21] Self-heating effects in ultra-scaled Si nanowire transistors
    Rhyner, Reto
    Luisier, Mathieu
    2013 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2013,
  • [22] Measurements of temperature distribution in polycrystalline thin film transistors caused by self-heating
    Sameshima, T
    Sunaga, Y
    Kohno, A
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1996, 35 (3A): : L308 - L310
  • [23] High Stability and Device Design for Self-Heating Reduction of a-Si:H TFT
    Wei, Chuan-Sheng
    Chiu, Chao-Chien
    Shen, Guang-Ren
    Chiou, Shiao-Hao
    Chen, Pei Ming
    Shih, Ching-Chieh
    Liu, Sheng Chao
    Lee, Yeong-Shyang
    Chen, Jim-Shone
    Huang, Wei-Ming
    2009 SID INTERNATIONAL SYMPOSIUM DIGEST OF TECHNICAL PAPERS, VOL XL, BOOKS I - III, 2009, : 1155 - 1158
  • [24] a-Si:H thin film transistors after very high strain
    Gleskova, H
    Wagner, S
    Suo, Z
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2000, 266 : 1320 - 1324
  • [25] The asymmetry dual-gate a-Si:H thin film transistors
    Liang, Chung-Yu
    Chen, Hsin-Li
    Yeh, F. S.
    Chang, T. C.
    IDW '07: PROCEEDINGS OF THE 14TH INTERNATIONAL DISPLAY WORKSHOPS, VOLS 1-3, 2007, : 1971 - 1974
  • [26] Effects of back-channel etching on the performance of a-Si:H thin-film transistors
    Ando, M
    Wakagi, M
    Minemura, T
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1998, 37 (07): : 3904 - 3909
  • [27] Effects of back-channel etching on the performance of a-Si:H thin-film transistors
    Ando, M.
    Wakagi, M.
    Minemura, T.
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (07): : 3904 - 3909
  • [28] Crystallization of a-Si:H on glass for active layers in thin film transistors -: Effects of glass coating
    Wang, YZ
    Fonash, SJ
    Awadelkarim, OO
    Gu, T
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1999, 146 (01) : 299 - 305
  • [29] Thermal behavior and self-heating effect in pentacene-based thin film transistors
    Wei, S.-C., National Chiao Tung University, Taiwan; Air Force Office of Scientific Research; Color Imaging Industry Promotion Office/Industrial Dev. Bureau; Electronics Research and Service Organization; Ministry of Education; et al (Society for Information Display):
  • [30] Self-heating induced instability of oxide thin film transistors under dynamic stress
    Kise, Kahori
    Fujii, Mami N.
    Urakawa, Satoshi
    Yamazaki, Haruka
    Kawashima, Emi
    Tomai, Shigekazu
    Yano, Koki
    Wang, Dapeng
    Furuta, Mamoru
    Ishikawa, Yasuaki
    Uraoka, Yukiharu
    APPLIED PHYSICS LETTERS, 2016, 108 (02)