Wet chemically prepared rutile TiO2(110) and TiO2(011): Substrate preparation for surface studies under non-UHV conditions

被引：9

作者：

Ahmed, M. H. M. ^{[1
]}

Lydiatt, F. P. ^{[1
]}

Chekulaev, D. ^{[1
]}

Wincott, P. L. ^{[2
,3
]}

Vaughan, D. J. ^{[2
,3
]}

Jang, J. H. ^{[4
]}

Baldelli, S. ^{[4
]}

Thomas, A. G. ^{[5
,6
]}

Walters, W. S. ^{[7
]}

Lindsay, R. ^{[1
]}

机构：

[1] Univ Manchester, Sch Mat, Ctr Corros & Protect, Manchester M13 9PL, Lancs, England

[2] Univ Manchester, Williamson Res Ctr Mol Environm Sci, Manchester M13 9PL, Lancs, England

[3] Univ Manchester, Sch Earth Atmospher & Environm Sci, Manchester M13 9PL, Lancs, England

[4] Univ Houston, Dept Chem, Houston, TX 77204 USA

[5] Univ Manchester, Sch Phys & Astron, Manchester M13 9PL, Lancs, England

[6] Univ Manchester, Photon Sci Inst, Manchester M13 9PL, Lancs, England

[7] Natl Nucl Lab, Didcot OX11 0QT, Oxon, England

来源：

SURFACE SCIENCE | 2014年 / 630卷

基金：

美国国家科学基金会; 英国工程与自然科学研究理事会;

关键词：

Metal oxide; Low miller index single crystal surface; Wet chemical preparation; Surface structure; Surface composition; SUM-FREQUENCY GENERATION; ATOMICALLY SMOOTH; TIO2; SURFACES; HYDROCARBONS; SPECTROSCOPY; ANATASE; FILM;

D O I：

10.1016/j.susc.2014.06.020

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A procedure for wet chemical preparation of TiO2 single crystal surfaces is detailed. The potential of this procedure is demonstrated through application to rutile-TiO2(110) and rutile-TiO2(011) substrates. Characterisation with atomic force microscopy, low energy electron diffraction, auger electron spectroscopy, and vibrational sum frequency spectroscopy indicates that flat, well-ordered, carbon-free surfaces can be generated. Notably, in contrast to the (2 x 1) low energy electron diffraction pattern observed for TiO2(011) prepared in ultra-high vacuum, wet chemical preparation results in a (4 x 1) unit cell; wet chemically prepared TiO2(110) displays an unreconstructed (1 x 1) surface. (C) 2014 Elsevier B.V. All rights reserved.

引用

页码：41 / 45

页数：5

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