Structure, composition and microhardness of (Ti,Zr)N and (Ti,AI)N coatings prepared by DC magnetron sputtering

被引：26

作者：

Ramana, JV ^{[1
]}

Kumar, S ^{[1
]}

David, C ^{[1
]}

Raju, VS ^{[1
]}

机构：

[1] CCCM, BARC, ECIL Post, Hyderabad 500062, Andhra Pradesh, India

来源：

MATERIALS LETTERS | 2004年 / 58卷 / 20期

关键词：

ternary nitride; magnetron sputtering; backscaftering spectrometry; microhardness; XRD;

D O I：

10.1016/j.matlet.2004.03.020

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The composition, structure and microhardness of (Ti,Zr)N and (Ti,Al)N thin films deposited by DC reactive magnetron sputtering technique have been studied. The films were synthesized with a single magnetron source by co-sputtering route using constituent elemental targets under different conditions of nitrogen gas flow and substrate bias. The X-ray diffraction (XRD) analysis indicated the formation of fcc (Ti,Zr)N and (Ti,AI)N phases. The atomic composition of films, determined by backscattering techniques, varied with deposition conditions. The microhardness of the films estimated by J-H model is closely related to the atomic composition of the films, particularly to their nitrogen content. (C) 2004 Elsevier B.V. All rights reserved.

引用

页码：2553 / 2558

页数：6

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