Distinguishability of N composition profiles in SiON films on Si by angle-resolved x-ray photoelectron spectroscopy

被引：17

作者：

Powell, C. J. ^{[1
]}

Werner, W. S. M.

Smekal, W.

机构：

[1] NIST, Surface & Microanal Sci Div, Gaithersburg, MD 20899 USA

[2] Vienna Tech Univ, Inst Allgemeine Phys, A-1040 Vienna, Austria

来源：

APPLIED PHYSICS LETTERS | 2006年 / 89卷 / 17期

关键词：

SILICON OXYNITRIDE FILMS; DEPTH-PROFILE; DIELECTRIC LAYERS; ELECTRON-SPECTRA; XPS; MICROELECTRONICS; SIMULATION; SCATTERING; CHEMISTRY; NITROGEN;

D O I：

10.1063/1.2363955

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Photoelectron intensities of N 1s and O 1s peaks at selected emission angles are reported for a SiON film on Si with different assumed amounts and distributions of N in the film. The intensities were determined from an efficient simulation tool for x-ray photoelectron spectroscopy (XPS) that incorporates appropriate values of elastic- and inelastic-scattering parameters in each region of the specimen as well as the finite angular acceptance of the analyzer. Appreciable dispersion of the intensities was found only for the N 1s peak at an emission angle of 75 degrees (with respect to the surface normal). Conventional analyses of angle-resolved XPS data that include such large emission angles are unlikely to be valid due to angle-dependent changes of the attenuation length. (c) 2006 American Institute of Physics.

引用

页数：3

共 50 条

[21] Angle resolved photoelectron spectroscopy as applied to X-ray mirrors: an in depth study of Mo/Si multilayer systems [J].

Sakhonenkov, Sergei S. ;

Filatova, Elena O. ;

Gaisin, Aidar U. ;

Kasatikov, Sergey A. ;

Konashuk, Aleksei S. ;

Pleshkov, Roman S. ;

Chkhalo, Nikolay I. .

PHYSICAL CHEMISTRY CHEMICAL PHYSICS, 2019, 21 (45) :25002-25010

[22] Surface analysis insight note: Straightforward concentration depth profiling by angle-resolved X-ray photoelectron spectroscopy using a Tikhonov regularization algorithm [J].

Murdoch, Billy J. ;

McCulloch, Dougal G. .

SURFACE AND INTERFACE ANALYSIS, 2023, 55 (09) :658-664

[23] Angle-resolved environmental X-ray photoelectron spectroscopy: A new laboratory setup for photoemission studies at pressures up to 0.4 Torr [J].

Mangolini, F. ;

Ahlund, J. ;

Wabiszewski, G. E. ;

Adiga, V. P. ;

Egberts, P. ;

Streller, F. ;

Backlund, K. ;

Karlsson, P. G. ;

Wannberg, B. ;

Carpick, R. W. .

REVIEW OF SCIENTIFIC INSTRUMENTS, 2012, 83 (09)

[24] In-depth analysis of InAlN/GaN HEMT heterostructure after annealing using angle-resolved X-ray photoelectron spectroscopy [J].

Bourlier, Yoan ;

Bouttemy, Muriel ;

Fregnaux, Mathieu ;

Patard, Olivier ;

Gamarra, Piero ;

Piotrowicz, Stephane ;

Delage, Sylvain ;

Etcheberry, Arnaud .

SURFACE AND INTERFACE ANALYSIS, 2020, 52 (12) :914-918

[25] Analysis of Layers and Interfaces in a Multi-Layer System and Schematic Simulation Using Angle-Resolved X-ray Photoelectron Spectroscopy [J].

Choi, Sun Gyu ;

Park, Hyung-Ho ;

Jeon, Hyeongtag ;

Chang, Ho Jung .

JOURNAL OF COMPUTATIONAL AND THEORETICAL NANOSCIENCE, 2009, 6 (11) :2398-2401

[26] Evaluation of the effect of hydrogen plasma treatment on the chemical bonding state and distribution of hydrogen in silicon nitride films by angle-resolved hard X-ray photoelectron spectroscopy [J].

Kirihara, Yoshiharu ;

Omata, Haruto ;

Yasui, Akira ;

Nakagawa, Kiyokazu ;

Mitani, Yuichiro ;

Nohira, Hiroshi .

JAPANESE JOURNAL OF APPLIED PHYSICS, 2025, 64 (01)

[27] Nondestructive Surface Depth Profiles from Angle-Resolved X-ray Photoelectron Spectroscopy Data Using the Maximum Entropy Method. I. A New Protocol [J].

Scorciapino, M. Andrea ;

Navarra, Gabrielle ;

Elsener, Bernhard ;

Rossi, Antonella .

JOURNAL OF PHYSICAL CHEMISTRY C, 2009, 113 (51) :21328-21337

[28] Determining the thickness of aliphatic alcohol monolayers covalently attached to silicon oxide surfaces using angle-resolved X-ray photoelectron spectroscopy [J].

Lee, Austin W. H. ;

Kim, Dongho ;

Gates, Byron D. .

APPLIED SURFACE SCIENCE, 2018, 436 :907-911

[29] Modelling of angle-resolved X-ray photoelectron spectroscopy (ARXPS) intensity ratios for nanocharacterisation of closely packed shell-core nanofibres [J].

Wang, Jian ;

Cumpson, Peter J. .

INSTRUMENTATION, METROLOGY, AND STANDARDS FOR NANOMANUFACTURING, 2007, 6648

[30] Non-destructive depth profile reconstruction of single-layer graphene using angle-resolved X-ray photoelectron spectroscopy [J].

Zemek, J. ;

Houdkova, J. ;

Jiricek, P. ;

Izak, T. ;

Kalbac, M. .

APPLIED SURFACE SCIENCE, 2019, 491 :16-23

← 1 2 3 4 5 →