Magnetic depth profiles in strained nickel thin films measured by polarized neutron reflectometry

We investigated the modifications of the magnetostrictive properties of nickel thin films due to relaxation strains at the substrate/film and film/vacuum interfaces. The in-plane magnetization rotation induced by a mechanical applied strain varies with the depth in the film. In nickel thin films submitted to strains of 3 x 10(-4) (expressed in relative deformation) the magnetization rotation is shown to be of 55 degrees at the vacuum/film and substrate film interfaces whereas it goes up to 65 degrees in the middle of the film. These magnetic depth profiles were measured by polarized neutron reflectometry with polarization analysis.