The measurement uncertainty of CD measurement in the optical measurement technology using Fourier Image

被引：0

作者：

Nagashima, Kuniharu ^{[1
]}

Abe, Hideaki ^{[1
]}

Oote, Makoto ^{[1
]}

Yamazaki, Yuichiro ^{[1
]}

机构：

[1] Toshiba Co Ltd, Anal Inspect & Metrol Engn Dept, Yokaichi 5128550, Japan

来源：

METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVIII | 2014年 / 9050卷

关键词：

Fourier Image; Optical measurement; CD measurement; Robustness; Measurement Uncertainty;

D O I：

10.1117/12.2048759

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Optical metrology system is used as high sampling CD measurement. The optical measurement technology using Fourier image can obtain much information with various optical conditions. We evaluated Fourier image method for CD metrology. Various issues of the optical measurement technology were found for CD measurement uncertainty. Measurement uncertainty depends on the number of position on Fourier image, and measurement uncertainty is improved by using multiple positions data. Top CD value is influenced by under layer pattern CD variance and under layer thickness variance. Optical CD measurement technology is influenced by various process variation like under-layer structure, stacked film thickness, material changes and so on. If optical measurement system applies to CD metrology, Fourier image method should be used in development phase for unfixed process because high number of data and speedy process feedback in no under layer situation is needed.

引用

页数：6