One-Step Combined-Nanolithography-and-Photolithography for a 2D Photonic Crystal TM Polarizer

被引：7

作者：

Choi, Kyung-Hak ^{[1
,2
]}

Huh, Jinwoo ^{[3
]}

Cui, Yonghao ^{[1
]}

Trivedi, Krutarth ^{[1
]}

Hu, Walter ^{[1
]}

Ju, Byeong-Kwon ^{[3
]}

Lee, Jeong-Bong ^{[1
]}

机构：

[1] Univ Texas Dallas, Dept Elect Engn, Richardson, TX 75080 USA

[2] Siliconfile Technol Inc, Songnam 463050, Gyeonggi Do, South Korea

[3] Korea Univ, Dept Elect Engn, Seoul 136701, South Korea

来源：

MICROMACHINES | 2014年 / 5卷 / 02期

基金：

美国国家科学基金会;

关键词：

combined-nanoimprint-and-photolithography; photonic crystals; hybrid mask mold; TM polarizer; SUPERPRISM PHENOMENA; LITHOGRAPHY; LIGHT;

D O I：

10.3390/mi5020228

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Photonic crystals have been widely investigated since they have great potential to manipulate the flow of light in an ultra-compact-scale and enable numerous innovative applications. 2D slab photonic crystals for the telecommunication C band at around 1550 nm have multi-scale structures that are typically micron-scale waveguides and deep sub-micron-scale air hole arrays. Several steps of nanolithography and photolithography are usually used for the fabrication of multi-scale photonic crystals. In this work, we report a one-step lithography process to pattern both micron and deep sub-micron features simultaneously for the 2D slab photonic crystal using combined-nanoimprint-andphotolithography. As a demonstrator, a 2D silicon photonic crystal transverse magnetic (TM) polarizer was fabricated, and the operation was successfully demonstrated.

引用

页码：228 / 238

页数：11

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