Opportunities and challenges for atomic, molecular, and optical physics in plasma chemistry

被引:0
|
作者
Becker, K [1 ]
Deutsch, H
Inokuti, M
机构
[1] Stevens Inst Technol, Dept Phys & Engn Phys, Hoboken, NJ 07030 USA
[2] Univ Greifswald, Inst Phys, Greifswald, Germany
[3] Argonne Natl Lab, Div Phys, Argonne, IL 60439 USA
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中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
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页码:399 / 406
页数:8
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