Magnetic field effect on the sheath thickness in plasma immersion ion implantation

被引：42

作者：

Keidar, M ^{[1
]}

Monteiro, OR

Anders, A

Boyd, ID

机构：

[1] Univ Michigan, Dept Aerosp Engn, Ann Arbor, MI 48109 USA

[2] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA

来源：

APPLIED PHYSICS LETTERS | 2002年 / 81卷 / 07期

关键词：

D O I：

10.1063/1.1499516

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The sheath thickness in plasma immersion ion implantation has been investigated in the presence of a transverse magnetic field. It has been found that the steady-state sheath thickness increases with increasing magnetic field strength. This result is in line with a simplified model of the sheath in which the steady-state sheath thickness is determined by the plasma density and ion velocity at the sheath edge. These results suggest that a magnetic field may be used to control the high-voltage sheath in plasma immersion ion implantation. (C) 2002 American Institute of Physics.

引用

页码：1183 / 1185

页数：3

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