Surface-enhanced infrared absorption spectroscopy using chemically deposited Pd thin film electrodes

被引:43
作者
Miyake, Hiroto
Hosono, Eiji
Osawa, Masatoshi
Okada, Tatsuhiro
机构
[1] Natl Inst Adv Ind Sci & Technol, Energy Technol Res Inst, Tsukuba, Ibaraki 3058565, Japan
[2] Hokkaido Univ, Catalysis Res Ctr, Sapporo, Hokkaido 0010021, Japan
基金
日本科学技术振兴机构;
关键词
D O I
10.1016/j.cplett.2006.07.063
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We report here the first observation of surface-enhanced infrared absorption (SEIRA) on chemically deposited Pd on Si. So far, SEIRA-active Pd films have been prepared by electrochemical deposition of Pd on SEIRA-active metals. When such films are used in solution to examine electrochemical reactions, however, Pd is dissolved into the solution at high potentials. The dissolution of Pd exposes the underlying metal surface and obscures the analysis of reactions on Pd surface. This problem can be removed by chemically depositing Pd directly onto the Si substrate. The strong SEIRAS effect of the chemically deposited Pd was demonstrated for CO adsorbed on the surface in acid under potential control. The dissolution of the Si substrate under anodic polarization is also discussed. (c) 2006 Elsevier B.V. All rights reserved.
引用
收藏
页码:451 / 456
页数:6
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