Generation of hydrogen ionic plasma superimposed with positive ion beam

被引:14
作者
Oohara, W. [1 ]
Fujii, M. [1 ]
Watai, M. [1 ]
Hiraoka, Y. [1 ]
Egawa, M. [1 ]
Morinaga, Y. [1 ]
Takamori, S. [1 ]
Yoshida, M. [1 ]
机构
[1] Yamaguchi Univ, Div Elect Elect & Informat Engn, Ube, Yamaguchi 7558611, Japan
关键词
ELECTRON-POSITRON PLASMA; H-FORMATION; CHARGE-TRANSFER; SCATTERING; MODES; WAVES; CONTAINMENT; TRANSPORT; SOLITONS; FUSION;
D O I
10.1063/1.5109805
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
In this study, a hydrogen ionic plasma with relatively low residual fractional electron concentration (n(e)/n(+) similar to 10(-2)) is generated using an aluminum plasma grid for the production of negative hydrogen ions and a control grid for negative ion extraction and electron removal. The ionic plasma is composed of negative and positive ions, containing molecular ions. Negative ions are in part produced using positive ions with several electron volts. A positive ion beam with 50 eV or more contributes to increase the density of the ionic plasma. The positive ion beam energy and the control grid bias voltage are tuned in such a way that a high-density ionic plasma is maintained. (C) 2019 Author(s).
引用
收藏
页数:11
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