Large area interference lithography using a table-top extreme ultraviolet laser: a systematic study of the degree of mutual coherence

被引:14
|
作者
Zuppella, P. [1 ]
Luciani, D. [1 ]
Tucceri, P. [1 ]
De Marco, P. [1 ]
Gaudieri, A. [1 ]
Kaiser, J. [2 ]
Ottaviano, L. [1 ]
Santucci, S. [1 ]
Reale, A. [1 ]
机构
[1] Univ Aquila, Dipartimento Fis, Gc LNGS INFN, I-67100 Laquila, Italy
[2] Brno Univ Technol, Inst Engn Phys, Brno 61669, Czech Republic
关键词
INTERFEROMETRIC LITHOGRAPHY; IMPRINT;
D O I
10.1088/0957-4484/20/11/115303
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
A prototype low cost table-top Ar capillary discharge laser source (1.5 ns pulse duration, lambda = 46.9 nm) was successfully used to produce, by means of interference lithography (with a simple Lloyd mirror setup), large area (0.1 mm(2)) regular patterns from 400 nm down to 22.5 nm (half-pitch) on PMMA/Si (PMMA: polymethylmethacrylate) substrates. The experiments allowed a systematical investigation of the degree of mutual coherence of the source, giving a clear indication that the interference lithography can be pushed down to the ultimate resolution limit of lambda/4.
引用
收藏
页数:4
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